Archive | Article on Sputter Deposition

Configuration and Specification of Perkin-Elmer 4480 sputtering process system

Configuration and Specification of Perkin-Elmer 4480 sputtering process system:

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Items

Perkin-Elmer 4450  uhv sputtering system

Basic System
  • New Controller :Allwin21 Corp.’s AW-4450 System Control
  • New Power Distribution Box: New, AC380V /208V/ 3Phase
  • Fully Refurbished Perkin-Elmer Original Frame
  • Fully Refurbished other parts, replace with new if necessary
  • Fully Refurbished Process Chamber
  • Fully Refurbished Load lock
  • Fully Refurbished Vacuum Systems for load lock and process chamber
Cathode Shape Delta
Cathode Size Delta
Cathode Port Amount 1 to 3
Cathode/Sputter Type DC Magnetron (RF Magnetron, RF Diode, Pulse DC are optional)
DC Power Supply 1-10 KW
RF Power Supply 1-3 KW
Process Gases Argon (200 SCCM) Standard, Up to 3 gas lines, MFC customized.
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Configuration and Specification of Perkin-Elmer 4450 uhv sputtering system

Configuration and Specification of Perkin-Elmer 4450 uhv sputtering system:

AccuSputter AW 4450 Sputter Deposition System

Items

Perkin-Elmer 4450  uhv sputtering system

Basic System
  • New Controller :Allwin21 Corp.’s AW-4450 System Control
  • New Power Distribution Box: New, AC380V /208V/ 3Phase
  • Fully Refurbished Perkin-Elmer Original Frame
  • Fully Refurbished other parts, replace with new if necessary
  • Fully Refurbished Process Chamber
  • Fully Refurbished Load lock
  • Fully Refurbished Vacuum Systems for load lock and process chamber
Cathode Shape Delta
Cathode Size Delta
Cathode Port Amount 1 to 3
Cathode/Sputter Type DC Magnetron (RF Magnetron, RF Diode, Pulse DC are optional)
DC Power Supply 1-10 KW
RF Power Supply 1-3 KW
Process Gases Argon (200 SCCM) Standard, Up to 3 gas lines, MFC customized.
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Configuration and Specification of Perkin-Elmer 4400 vacuum deposition systems:

Configuration and Specification of Perkin-Elmer 4400 vacuum deposition systems:

AccuSputter AW 4450 Sputter Deposition System

Items

Perkin-Elmer 4400

Basic System
  • New Controller :Allwin21 Corp.’s AW-4450 System Control
  • New Power Distribution Box: New, AC380V /208V/ 3Phase
  • Fully Refurbished Perkin-Elmer Original Frame
  • Fully Refurbished other parts, replace with new if necessary
  • Fully Refurbished Process Chamber
  • Fully Refurbished Load lock
  • Fully Refurbished Vacuum Systems for load lock and process chamber
Cathode Shape Circular
Cathode Size 8 inch
Cathode Port Amount 1 to 4
Cathode/Sputter Type RF Magnetron (DC Magnetron, RF Diode, Pulse DC are optional)
DC Power Supply 1-5 KW
RF Power Supply 1-2 KW
Process Gases Argon (200 SCCM) Standard, Up to 3 gas lines, MFC customized.
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Utilities and Dimension of PE 4480 reactive sputtering system

Utilities and Dimension of  PE 4480 reactive sputtering system

  • Rear-mounted electrical, water, gas and LN2 inlet panel
  • Power distribution box
  • Water flow switch panel and manifold
  • DC or RF power supply: 208VAC, 60Hz, 3phases, 60A, 4 wires
  • Vacuum system: 208VAC, 60Hz, 3phases, 60A, 5 wires
  • Cooling Water: 1.8gpm3
  • Process N2: 60-70 psi
  • Process Argon: 5-10 psi
  • CDA: 40-60 psi
  • Dimension: 65″W x 46″D x 68″H
  • Weight: 2,288 lbs 

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