Configuration and Specification of Perkin-Elmer 4480 sputtering process system:
| Items |
Perkin-Elmer 4450 uhv sputtering system |
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| Basic System |
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| Cathode Shape | Delta | ||
| Cathode Size | Delta | ||
| Cathode Port Amount | 1 to 3 | ||
| Cathode/Sputter Type | DC Magnetron (RF Magnetron, RF Diode, Pulse DC are optional) | ||
| DC Power Supply | 1-10 KW | ||
| RF Power Supply | 1-3 KW | ||
| Process Gases | Argon (200 SCCM) Standard, Up to 3 gas lines, MFC customized. | ||



