Process Chamber of PE 4450 Sputtering Deposition System,28" diameter X 12" high stainless steel cylinder with 6" CF flange viewport and load lock port
Archive | Article on Sputter Deposition
Process Chamber of Perkin Elmer 4480 Sputter Deposition System
- 28" diameter X 12" high stainless steel cylinder with 6" CF flange viewport and load lock port , 28" diameter stainless steel top plate.
Process Chamber of Perkin Elmer 4410
Process Chamber of Perkin Elmer 4410,28" diameter X 12" high stainless steel cylinder with 6" CF flange viewport and load lock port,28" diameter top plate
Process Chamber of Perkin Elmer 4400
Process Chamber of Perkin Elmer 4400 Sputter Deposition System
- 28″ diameter X 12″ high stainless steel cylinder with 6″ CF flange viewport and load lock port
- 28″ diameter stainless steel top plate.
- 28″ diameter stainless steel base plate
- 11/2” air-operated roughing isolation valve
- Air-operated gas inlet valve
- Air-operated vent valve
- 11/2“blanked-off leak check port
- Removable deposition shields
- 23″ diameter, 3-position water-cooled annular substrate table with variable-speed motorized table drive
- Full circle shutter with vane shutter
- Chain drive pallet carrier transport
- Heavy duty electric hoist
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Perkin-Elmer 4400-Series System Overview
Perkin-Elmer 4400-Series System -Production Sputtering Systems are manufactured in three (3) specific configurations, as follows:
A manually-loaded system capable of limited automatic operation, but requiring manual selection of target and sputtering mode. The Model 4400 sputtering head is equipped with four (4) 8″ round cathode positions, one (1) of which may be fitted with an in-process heater fixture in place of a target (Mo shields, vane shutter, and full circle shutter.)…
Utilities and Dimension of AccuSputter AW 4450
Utilities and Dimension of AccuSputter AW 4450
- Rear-mounted electrical, water, gas and LN2 inlet panel
- Power distribution box
- Water flow switch panel and manifold
- DC or RF power supply: 208VAC, 60Hz, 3phases, 60A, 4 wires
- Vacuum system: 208VAC, 60Hz, 3phases, 60A, 5 wires
- Cooling Water: 1.8gpm3
- Process N2: 60-70 psi
- Process Argon: 5-10 psi
- CDA: 40-60 psi
- Dimension: 65″W x 46″D x 68″H
- Weight: 2,288 lbs
Configuration of AccuSputter AW 4450
Configuration of AccuSputter AW 4450
| Model |
AccuSputter AW 4450 |
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| Delta Cathode Configuration | Circular Cathode Configuration | |||||||||||||||||
| Basic System |
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| Cathode Size | Delta | 8″ | 6″ | 5″ | 4″ | 3″ | 2″ | 14″ | ||||||||||
| Cathode Port Amount | 1 | 2 | 3 | 1 to 4 | 1 to 8 | 1 | ||||||||||||
| Sputter Type | DC Magnetron | RF Magnetron | RF Diode | Pulse DC | ||||||||||||||
| DC Power Supplier | 1-10KW | 1-5KW | ||||||||||||||||
| RF Power Supplier | 1-3KW | 1-2KW | ||||||||||||||||
| Substrate Size | ~ 8 inch | ~6inch | ~4inch | ~3inch | ~3inch | ~2inch | ~1inch | ~12inch | ||||||||||
| Wafer Load | Manually load | |||||||||||||||||
| Throughput per Batch | 3/4/5/6/8″ Wafer Size: 30/14/10/8/5 pieces | 3/4/5/6″ Wafer Size:30/14/10/8 pieces | 12″/1 | |||||||||||||||
| Sputter Rate | 20 to 500 Angstroms/kw-min depending on different model, cathode, process, sputter material etc | |||||||||||||||||
| Uniformity Capacity | ±5%~7% | ±7%~10% | ||||||||||||||||
| Options |
* Turbo pump for load lock |
* Load lock heating function (200 oC) |
* RF Etch |
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* Dry pump or mechanical pump |
* Process Chamber heating function (360 oC) |
* RF Bias |
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Vacuum Systems for AccuSputter AW 4450
Vacuum Systems for the process chamber and loadlock of AccuSputter AW 4450
- 2 stage Cryopump with 1000 l/s pumping speed for air, including chevron, water-cooled compressor and lines, automatic regeneration controller and plumbing kit. 71/2″ O.D. (6″ ASA) aluminum air-operated gate valve, Air-operated venetian blind throttling valve.
Loadlock of AccuSputter AW 4450
Loadlock of AccuSputter AW 4450
- 30″ x 28″ x 8″ stainless steel load lock chamber with aluminum cover
- 2″ air-operated roughing isolation valve
- Air-operated vent valve
- 23″ diameter molybdenum annular substrate pallet
- Pallet carrier and chain drive transport
Process Chamber of AccuSputter AW 4450
AccuSputter AW 4450 Series Production Sputter Systems are manufactured in the configuration of a manually-loaded system capable of fully automatic operation
