Manufacturer: Allwin21 Corp.
Condition: New
Wafer Size: Small~8 inch
Type: Stand Alone, Atmospheric
Temperature: 100~800°C or 450~1250°C. Long time and Higher temperature processes are available. Pls contact us for detail.
Lamp Zones: 10 from Jan. 2022
Gas Lines: 1 ~ 6 lines
Options: Integrated solid robotic wafer transfer ; SMIF (Standard Mechanical Interface) load port transfer. Add Double O Ring and/or O2 Sensor/Analyzer for O2 sensitive applications and saving GaAs, InP, GaN, GaInP, SiC and other valuable compound material wafers .
Chamber Design: Allwin21
PowerSum Function: Save valuable compound material wafers.
RTP Main Customers: Link
Free Fast Quote: Link
The AccuThermo AW820M is a stand alone rapid thermal processing (RTP) system, which uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. The process periods are typically 1‑1800 seconds in duration, although periods of up to 9999 seconds can be selected. These capabilities, combined with the heating chamber’s cold-wall design and superior heating uniformity, provide significant advantages over conventional furnace processing. The AccuThermo AW820M rapid thermal annealing system consists of an oven unit and a controller computer running the Allwin21 RTAPRO controller software. The wafer to be processed is placed on a quartz tray that slides into a quartz isolation tube in the oven unit. Four banks of lamps, two above the quartz tube and two below it, provide the source of energy for heating the wafer. The lamps can be controlled manually and automatically from the controller computer. The RTAPRO control software allows full control and diagnostics of the AccuThermo AW820M RTP system. In addition, it allows the creation of recipes for automated control of the temperature and, optionally, process gas flow. The control software uses a set of operating instructions known as recipes to automatically control the AccuThermo RTP system. These recipes are created by the Process Engineer to monitor and control the parameters of the processing cycle. The Operator then uses the software to select and run the process parameters (steady state temperature, process time, ramp rates, etc.). The RTAPRO software is also used to create, delete, copy, modify and store the recipes and to execute system diagnostics.AccuThermo AW820M Overview:
AccuThermo AW820M Key Features:
- Long time process with big cabinet. Design capability is 60 minutes@1000°C. Recommend 30 minutes@1000°C.
- Heating chamber’s cold-wall design with gold plating finish which has been approved in 30 years (►).
- Atmospheric Rapid Thermal Annealing system with Top and bottom IR lamp heating for superior heating uniformity (►).
- Closed-loop temperature control with pyrometer (No-Contact) or thermocouple temperature sensing (►).
- Precise time-temperature profiles tailored to suit specific process requirements (►).
- Fast heating and cooling rates unobtainable with conventional technologies.
- Consistent wafer-to-wafer process cycle repeatability which is the most important characteristic of rapid thermal annealing systems.
- Elimination of external contamination with isolated quartz tube.
- Small footprint and energy efficiency.
- Software which integrates all of the Process Control into a single reliable software package (►).
- GUI interface (►).
- Real-Time process data acquisition (►).
- Real-Time graphics (►).
- Process Data Analysis (►).
- Process Data and Recipe storage on a hard drive (►).
- Recipe Editor for Multi-step Processing (►).
- Easy Recipe Editor (►).
- System Diagnostics function (►).
- Chamber calibration data for smooth control (►).
- Easy software pyrometer calibration (►)
- Easy software gas calibration (►)
- Easy software thermocouple calibration (►)
- Power summary function for better performance repeatability control (►).
- More IO AD DA hardware exposed for easier maintenance and trouble shooting (►)
- The watchdog timer shuts down the lamps to prevent run-away heating of the wafer.
Applications
The AccuThermo RTP system is a versatile tool that is useful for many applications:
- Ion Implant Activation
- Polysilicon Annealing
- Oxide Reflow
- Silicide Formation
- Contact Alloying
- Oxidation and Nitridation
- GaAs Processing
Heating, Cooling, and Temperature Measurement
The following list contains the key features of the AccuThermo AW820M RTP system heating, cooling and temperature measurement systems:
- High-intensity visible radiation heats wafers for short periods of 1 to 9999 seconds at precisely controlled temperatures in the 400°C to 1250°C range. (1 to 1800 second heating periods are used typically.)
- Tungsten halogen lamps and cold heating chamber walls respectively allow fast wafer heating and cooling rates.
- The system delivers time and temperature profiles tailored to suit specific process requirements.
- Pyrometer or thermocouple sensing offers precise closed-loop temperature control.
- Cooling N2 flows around the lamps and quartz isolation tube
- MFC controlled gases (up to Six) flow through the heating chamber for purge and/or process purposes.
AccuThermo AW820M Basic Configuration:
-
AccuThermo AW820 Main Frame with wires.
-
Aluminum chamber with water cooling and gold plating.
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Isolated Quartz Tube without window.
-
Oven control board and main control board
- Bottom and top heating with 27 (1.5 KW ea, TOP 13 lamps, BOTTOM 14 lamps) Radiation heating lamp module with 10 bank zones
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ZONE1-5, Top, from front to rear
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ZONE( 1 ), TOP ( front ) ( 2 ) lamps
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ZONE( 2 ), TOP ( ) ( 3 ) lamps
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ZONE( 3 ), TOP ( center ) ( 4 ) lamps
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ZONE( 4 ), TOP ( ) ( 3 ) lamps
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ZONE( 5 ), TOP ( rear ) ( 2 ) lamps
-
-
ZONE6-10, Bottom, from front to rear
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ZONE( 6 ), BOTTOM ( front ) ( 2 ) lamps
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ZONE( 7 ), BOTTOM ( ) ( 3 ) lamps
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ZONE( 8 ), BOTTOM ( center ) ( 3 ) lamps
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ZONE( 9 ), BOTTOM ( ) ( 3) lamps
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ZONE( 10 ), BOTTOM ( rear ) ( 2 ) lamps
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-
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Quartz Tray for 5 to 8 inch round wafer
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6 gas lines with 1-6 MFCs. Option.
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Computer Board with AW Software, Touch Screen Monitor, Mouse, Standard
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T Shape Quartz with TC and one Quartz holder for 100-800°C
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One package of 5 pieces of thermocouple wires
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One USB with original Software backup
AccuThermo AW820M Specifications:
AccuThermo AW820M Gallery:
1. Dimension and Weight Equipment Weight 2. Air Conditioning: The moisture in the ambient air around the AccuThermo RTP should not condense on any part of the system. Temperature is 20-30°C and humidity is Non-condensing. 3. Electrical Connections Power requirements vary between the United States, Japan and Europe. Specifications for each are shown in the following table. Specification Equipment Voltage Frequency Current Phases # Wires Notes USA Oven 208/240 60 Hz 100 A 3 5 1, 2, 3, 4 Chiller 110-120 60 Hz 11 A 1 3 Computer 110-120 60 Hz Variable 1 3 5 Japan Oven 200 50/60 Hz 100 A 3 5 1, 2, 3, 4 Chiller 100 50/60 Hz 11 A 1 3 Computer 100 50/60 Hz Variable 1 3 5 Europe Oven 220/240 50 Hz 100 A 3 5 1, 2, 3, 4 Chiller 220-240 50 Hz 5.5 A 1 3 Computer 220-240 50 Hz Variable 1 3 5 Note 1: Use an isolation transformer to reduce interference to other equipment. Note 2: Locate oven within 25 feet line length of isolation transformer. Note 3: Locate power-disconnect switch within reach of the system. Note 4: 3 supply wires, 1 neutral and 1 ground wire Note 5: Computer current will be dependent upon the computer manufacturer. 4.0 Cooling, Process Gas and Exhaust Requirements Oven cooling water, process gas, tube cooling gas, and exhaust requirements are described below: pre-filtered with conventional particulate filter to 100 microns (No DI or Distilled Water) inlet and outlet1/2” tube x 3/8” male pipe swagelok pyrometer fittings, inlet and outlet1/4” swagelok Nitrogen (N2) or Clean-Dry-Air (CDA) oil‑and-water-free, filtered to 3 microns Any inert and/or non-corrosive gas. Typically, Nitrogen (N2), oxygen (O2), argon (Ar), and/or helium (He) are used. (scrubber draw)–0.5” waterminimum –0.75” watertypical –1.0″ watermaximum fitting 1/4″ female VCR fitting out to building scrubber system Oven Chassis 20 scfm566 slpm fitting 4″ exhaust vent connected to house exhaust systemAccuThermo AW820M Facility:
Diminsions
AccuThermo AW820M
70″ H x 39″ W x 54” D
800 LBS
Cooling Water
type
flow rate
3 gpm
11.6 lpm
minimum
inlet pressure
30 psig
2.1 kg/cm2
minimum
40 psig
2.8 kg/cm2
typical
60 psig
4.2 kg/cm2
maximum
pressure differential
10 psi
0.7 kg/cm2
inlet temperature
15 °C
minimum
20 °C (3 °C above dew point)
typical
35 °C
maximum
oven fitting,
Quartz Isolation Tube Cooling Air
type
flow rate
10-15 SCFM
283-425 slpm
minimum
inlet pressure
15 psig
1.05 kg/cm2
minimum
20 psig
1.4 kg/cm2
typical
30 psig
2.1 kg/cm2
maximum
fitting
3/8″ Parker Push-Lok . Recommended tubing is 3/8″ OD nylon.
Process Gases
type
pressure
10 psig
0.7 kg/cm2
minimum
20 psig
1.4 kg/cm2
typical
30 psig
2.1 kg/cm2
maximum
flow rate
0-10 SLPM
filtering
pre-filtered to 1 micron
fitting
1/4″ female VCR fitting
Process Exhaust
flow rate
10 slpm
back pressure
Exhaust
Pneumatic Actuation Gas Valve
type
Clean Dry Air (CDA) or Nitrogen (N2)
Inlet Pressure
80 psig (5.6 kg/cm2) ± 5 psig (0.35 kg/cm2)
Flow
Less Than 1 SCFM Typical
fitting
1/4” tube swagelok
FAQ on Rapid Thermal Processing System:
1. Q: Which model should I purchase?
A: Normally your biggest substrate size determines the model. AccuThermo AW610M is up to 6 inch; AccuThermo AW820M, AccuThermo AW820V (NOT RECOMMENDED) are up to 8 inch.
2. Q: Can I use AccuThermo AW610M,AccuThermo AW820M for 2,3,4,5 inch substrate?
A: Yes. You can.
Model | 2 inch | 3 inch | 4 inch | 5 inch | 6 inch | 8 inch |
AccuThermo AW 610M | 4 pieces | 3 pieces | 1 piece | 1 piece | 1 piece | N/A |
AccuThermo AW 820M | 16 pieces | 5 pieces | 4 pieces | 1 piece | 1 piece | 1 piece |
AccuThermo AW 820V | 16 pieces | 5 pieces | 4 pieces | 1 piece | 1 piece | 1 piece |
3. Q: Which type of RTP should I purchase, Atmospheric or Vacuum (NOT RECOMMENDED)?
A: You can run most processes by Atmospheric RTP. Atmospheric RTP has much better performance ( repeatability, stability, uniformity) than traditional vacuum RTP because of atmospheric RTP’s compact chamber design, isolated quartz tube, top&bottom lamp heat, pure gas purge, 40 years approval. The ownership cost and usage cost of Atmospheric RTP are lower. If you are not sure that you have to use vacuum RTP because of O2, you can buy atmospheric RTP with forming gas to get 2 to 12 PPM O2 environment instead of vacuum RTP. Bad performance ( repeatability, stability, uniformity) and contamination issue are vacuum RTP fatal problems.
4. Q: What are the differences in Allwin21 vacuum RTPs?
A: AccuThermo AW820V is up to 8 inch wafer. It comes with top and bottom lamp heating ( 27 lamps ,1.5 KW ea, TOP 13 lamps, BOTTOM 14 ,10 bank zones control). The maximum temperature is 1250C. According to our 40 years RTP experience, we do not recommend vacuum RTP.
5. Q: Should I have to use susceptor for transparent substrate?
A: Normally transparent substrate can not absorb lamp heat since it is transparent. You have to use carrier which can absorb lamp heat and transfer the heat to transparent substrate. Susceptors can be made of SiC, Silica,Graphite,or Si. They can be costly. You can use a Si wafer as carrier if your process is applicable. You can us a Si wafer with pocket, instead of susceptor, if your budget is tight. A susceptor will lower the ramp rate and cooling rate significantly because of its size and thickness.
6. Q: Which material of susceptor should I purchase?
A: Traditionally people use graphite with SiC coating for susceptor. Graphite susceptor is for up to 950C with lower ramp rate. Silica susceptor is for up to 1100C with higher ramp rate. Sintered SiC susceptor is for up to 1100C with lower ramp rate. Si susceptor is less expensive and up to 750C with lower ramp rate. The bigger the size of susceptor, the lower the ramp&cooling rate.Susceptors made of Graphite with SiC Coating are the most popular in the market.
7. Q: Should I purchase an ERP Pyrometer as high temperature sensor?
A: Thermocouples (TC’s) are the traditional temperature sensor for lower than 1050C. But TC will react with Si wafer at 750C. Our non-contact patented ERP Pyrometer can work at 400~1250C with precise measurement after calibration by AW technology. TC has to contact the substrate for temperature measurement while ERP Pyrometer is non-contact. TC cost is lower while ERP Pyrometer’s is higher (more than $15K with calibration tools (TC wafer and omega meter). TC will evaporate at high temperature causing contamination. Shield TC with SiC cap for 200-1100C is only for low budget customers.
8. Q: Can I measure the temperature uniformity by multiple points TC wafer?
A: If the temperature is lower than 500C, you can measure the temperature uniformity by TC wafer directly. If the temperature is higher than 500C, you have to measure other parameters’ uniformity to reflect the process uniformity. The influence of lamp, chamber, the structure of TC wafer etc is significant at higher than 500C. Semiconductor industry measures sheet resistance. LED industry measures voltage.
9. Q: Can I have a demo before purchase?
A: We have AccuThermo AW 610M demo systems in our facility in USA. We can do demo one time for you if you can send your wafer to us and our facilities are applicable. But be aware that you cannot evaluate the performance by a few demo results because of the following. (1) The demo condition might not be good enough; (2) Your recipe parameters might not be applicable because RTP temperature number in recipe is relative, not real.
10. Q: What is the most important feature for RTP system?
A: Production proven repeatability. If the RTP system performance is not repeatable, the RTP is a concept one and it will be “Rapid Trash Process”. It is crucial to buy an RTP that has been produced and verified by many customers, because we cannot buy expensive semiconductor equipment based on the product brochures, nor can we verify a semiconductor equipment based on one or two users.
11. Q: How many gas lines can Allwin21 RTP come with?
A: AccuThermo AW 610M, AccuThermo AW820M, AccuThermo AW820V come with 6 gas lines with 1 to 6 of MFCs. Customizing is optional. The popular MFCs are 10 SLM N2, Ar, O2 and 5 SLM NH3, N2O2.
12. Q: Can customer install the RTP by themselves?
A: Yes. Our RTP systems are customer-install design. We sold our RTP systems to more than 35 countries. Most customers installed our RTP systems by themselves according to our professional manuals. We provide free technical supports by email, phone, skype, APPs etc. We have local reps who can provide 24/7 service in some countries if applicable.
13. Q: Why should we purchase an RTP from Allwin21?
A: (1) Best production proven performance( Repeatability, Uniformity, Stability).
(2) Our system hardware and software technology have been approved based on 40 years of semiconductor industry development.
(3) It can cost a lot money and time to test an unpopular or new concept RTP systems .
(4) Allwin21 focuses on RTP as our main business. We professionally provide high quality RTP system and technical support.
(5) Reasonable price accepted by thousands of customers from 40 countries. Many options at different costs for different configurations, meeting different customers’ budget.
(6) Industry-leading lead time (2 to 8 weeks).
(7) Options: Double O Ring and/or O2 Sensor/Analyzer for O2 sensitive applications and saving GaAs, InP, GaN, GaInP, SiC and other valuable compound material wafers
(8) PowerSum Function: Save valuable compound material wafers.
(9) Option: Non-contact ERP Pyrometer, AG Associates Patented Parts, for best RTP performance for 400-1250C.
Contact Us for More Information
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