Tag Archives | Matrix

Allwin21 Corp. has been focusing on providing solutions and enhancements to Matrix 105, Matrix 105R, Matrix 205, Matrix 10 (1104, 1107, 1108) used plasma Asher Descum semiconductor process equipment and Matrix 303,Matrix 403 ,Matrix 10(1303, 1307)used plasma Etch semiconductor process equipment. These OEM semiconductor equipment have been used in productions and R&D since 1990′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system(Video) and new critical components to achieve the goal of giving our customers a production edge with right cost.

AW-10R Plasma Asher

Manufacturer: Allwin21 Corp.
Condition: New
Wafer Size: 6″ – 8″ Capability
Wafer Loading: 3-axis Robot; Stationary Cassette Plate
Plasma Power: 1000W Air-Cooled RF 13.56MHz
Type: Downstream/Parallel/Single Wafer Process; Stand-Alone
Gas Lines: 1-3 Lines MFCs. Typical gases are 5 SLM O2, 500 SCCM O2,1000 SCCM N2.
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AW-105R Plasma Asher

AW-105R Plasma Stripper Asher . Wafer Size: 3-6.25 inch. 1-4 gas lines with MFCs. 60-200C Temperature with CLTC control . Anodized Chuck with Element heating and chiller cooling. Stand Alone. Integrated solid robotic wafer transfer. Single Wafer Process. Suitable for high uniformity, repeatability processes.
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