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Configuration and Specification of Perkin-Elmer 4450 uhv sputtering system

ByArticle on Sputter Deposition

Configuration and Specification of Perkin-Elmer 4450 uhv sputtering system:

Items	Perkin-Elmer 4450 uhv sputtering system
Basic System	New Controller :Allwin21 Corp.’s AW-4450 System Control New Power Distribution Box: New, AC380V /208V/ 3Phase Fully Refurbished Perkin-Elmer Original Frame Fully Refurbished other parts, replace with new if necessary Fully Refurbished Process Chamber Fully Refurbished Load lock Fully Refurbished Vacuum Systems for load lock and process chamber
Cathode Shape	Delta
Cathode Size	Delta
Cathode Port Amount	1 to 3
Cathode/Sputter Type	DC Magnetron (RF Magnetron, RF Diode, Pulse DC are optional)
DC Power Supply	1-10 KW
RF Power Supply	1-3 KW
Process Gases	Argon (200 SCCM) Standard, Up to 3 gas lines, MFC customized.
Substrate Size	Small to 6 inch
Wafer Load	Manually load,capable of fully automatic operation
Throughput per Batch	3” wafer, 30 pieces ; 4”wafer, 13 pieces; 5” wafer, 9 pieces; 6” wafer,7 pieces; 8’ wafer, 5 pieces
Sputter Rate	20 to 500 Angstroms/kw-min depending on different model, cathode, process, sputter material etc
Uniformity Capacity	±5%~7%
Options	* Turbo pump for load lock * Dry pump or mechanical pump * Cathode Blank Cover	* Load lock heating function (200^oC) * Process Chamber heating function (360^oC) * Reactive Sputter	* RF Etch * RF Bias * Co-Sputter

Configuration and Specification of Perkin-Elmer 4410 plasma sputtering systems

Configuration and Specification of Perkin-Elmer 4480 sputtering process system

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hermal annealer, Lindberg furnaces,Plasma therm ICP (deep RIE), Plasma therm PECVD, Plasma term RIE, STS PECVD, PlasMos ellipsometer, Ozone stripper, Alpha step profilometer, Veeco Dektak profilometer, Filmetrics Profilm3D Profilometer Tencor Alpha-Step 200 Profilometer AST VCA Optima XE Zeiss Axiotech Microscope Cascade Probe Station PDMS Alignment Tool 3D Systems Figure 4 3D Printer Motic BA310MET-T Microscope CorSolutions PDMS Port Creator Disco DAD 2H/6T Wafer Dicer Fisher Muffle Furnace Lindberg/Blue M Tube Furnace Blue M Oven Lindberg/Blue M Oven Unitron Z10 Stereo Zoom Microscope Leica Stereo Zoom Microscope Electro-Technic Products BD-20 Corona Treater Harrick PDC-32G Plasma Cleaner PDMS Station Brewer Science Cee 100 PVD Chamber Stratasys Mojo 3D Printer Universal M-25 CO2 LASER Engraver SUSS MicroTec PMC-150 Cryoprober Keysight PNA Network Analyzer N5127B DC-67 GHz Lakeshore CPX Cryogenic Probe Station Zurich Instruments HF2LI Lock-in Amplifier Cascade Microtech Model 9000 Manual RF Probe Station QuikLaze-50 Multi-Wavelength Laser Trimming Station JFP Microtechnic Flip Chip Bonder WestBond 747677E Three-Way Convertible Manual Bonder Cincinnati Sub-Zero MicroClimate Temperature Chamber Zyvex tDriver 1600 Micro-Electro-Mechanical (MEMS) Control Station Lithography Equipment DUV Exposure Station and Aligner MicroWriter ML3 Pro Metrology Equipment Ellipsometer Reflectometer Atomic Force Microscope (AFM) Scanning Electron Microscope (SEM) NIR-UV-VIS Spectrophotometer Measuroscope Optical Microscope Plasma etching (Deep Reactive Ion Etching) Analytic Probe Contact Profilometer Optical Profilometer Processing Equipment Plasma Asher Hot Plate Station Non-vacuum Oven Denton Plasma Coating Xanthos Hood Probestation (Zeus) PE50 O2 Plasma Asher Oxidation Furnace-Wet Teaching Bay Diffusion Furnace (MRL P-Type) Teaching Bay Diffusion Furnace (MRL N-Type) Hydra Wet Hood Chimera Wet Hood Wafer Bonder 3-Zone Tube Furnace Ebeam Evaporator RTP Oxford ICP/RIE Back-End Processing Critial Point Dryer Lapping and Polishing Tool LatticeGear Scribing Tools MA 1006 Dicing Saw Chemical Vapor Deposition EasyTube Diffusion Furnace Fiji Plasma ALD GSI 2000 PECVD SSI Solaris RTA Etching AutoGlow 200 Plasma Cleaner Oxford 100 ICP RIE Oxford 80+ ICP RIE Oxford Cryo Bosch DRIE XeF2 Silicon Etcher Lithography EVG 620 Mask Aligner Heidelberg DWL-66 Laser Mask Writer Laurell Spinners YES HDMS Prime Ovens Metrology Filmetrics F54-UV Reflectometer Four Point Probe Station KLA P-7 Stylus Profiler Olympus BH-2 Optical Microscope Woollam Ellipsometer Zeta-20 Optical Profiler Sputtering and Evaporation Denton E-Beam Evaporator KJL Sputterer Nano38 Thermal Evaporator PETE E-Beam Evaporator PECVD PEALD AJA Magnetron Sputter SuSS MJB4 Contact Aligner Vacuum Oven Chemical Hoods Deposition Equipment E-Beam Evaporator Lithographic Tools LaserWriter.jpg UV Mask Aligner (front side and front to back) Laser Writer MLA Interferometric Lithography System 100KV Electron Beam Lithography System (JEOL 9100 FS) Raith 30KV Electron Beam Lithography System Focused Ion Beam System Plasma and Reactive Ion Etching Oxford ICP etching system (2 chambers - 1 loadlock) Oxford 6 Inch ICP March RIE etchers Wet Processing WAFER PRIMING OVEN LAMINAR FLOW PROCESS STATIONS Deposition Small Coater AJA Oxide Sputter System AJA Sputter System (metals) FC2000 Ferrotec Ebeam Evaporator(metals) ICP - CVD Deposition System Nanocarbon Synthesis Facilities Lamda Microwave Plasma CVD system (nanocrystalline diamond deposition) Thermal/PECVD System for Synthesis of CNT and Graphene Seeding Station for UNCD Deposition Metrology SPECTROSCOPIC ELLIPSOMETER SCANNING PROBE MICROSCOPE SURFACE PROFILOMETERS Filmetrics F40-UV OPTICAL MICROSCOPE RESISTIVITY MEASUREMENT SYSTEM SCANNING VIBRATING ELECTRODE SYSTEM VOLTAMMETRY SYSTEM Misc Tools ADT 7200 Dicing Saw Critical Point Dryer Jeol JBX-5500FS Electron Beam Writer Nanonex NX-2004 ABM Mask Aligner Thermionics eBeam Evaporator AJA ATC-2200 Denton Desk II Brewer Cee 200X KRI KDC75 Oxford Instrument Plasmalab System 100 ICP Oxford Instrument Plasmalab System 80 Fume Hoods Allwin AW 410 Ultraviolet Ozone Cleaning System Characterization X-ray Photoelectron Spectroscopy Electron Microprobe Scanning Electron Microscope ICP-MS ICP-OES RAMAN Combustion Elemental Analyzer (CHN) Leica GZ Stereo Microscope Spectroscopic Ellipsometer WYKO NT1100 3-D Profiling System Lithography and NanoImprint Electron Beam Nanolithography System Nanonex NX1000 NanoImprint OAI Mask Aligner Model 800 Thin-film deposition Angstrom Engineering 6-pocket E-Beam Evaporator IntlVac - Nanochrom I Sputterer Oxford Instruments - Atomic Layer Deposition (ALD) System - OpAL Nanonex_Ultra Plasma etching Oxford Instruments - RIE-ICP PlasmaPro 100 Cobra Oxford Instruments RIE NGP80 Sample Preparation VWR Vacuum Oven - AFM - Asylum MFP3D - Confocal Laser Scanning Microscope – Zeiss LSM 700 - Contact angle - Dataphysics OCA15plus - Dynamic Light Scattering (DLS) – AvidNano W130i - Optical Microscope – Olympus BX51 - Optical Stereo Microscope - Leica M80 - Scanning Electron Microscopy Focused Ion Beam (SEM-FIB) workstation - Tabletop microscope TM3030 Plus Hitachi - Drying oven - Electro-optical bench - Glove Box - Heated vacuum desiccator - Langmuir–Blodgett - NMR Spectrometer - Precision Balance - Rotovapor - UV/Vis Spectrophotometer - Agilent 4155C semiconductor parameter analyzer + Cascade Microtech M150 manual probe station - Agilent 4155C semiconductor parameter analyzer + Everbeing C-2 Mini manual probe station - Biorad/Nanometrics HL5500 Hall effect systems - Jandel Four point prober - Keithley 4200 SCS semiconductor parameter analyzer + Janis ST-500 cryogenic probe station - Keysight B1500A semiconductor parameter analyzer + Cascade Microtech EPS 150 manual probe station - Potentiostat Gamry Reference 600 - Heidelberg µPG 101 Tabletop Micro Pattern Generator - Hot plates - Spinners for resist coating and development - Suss MA6 UV mask aligner - Suss substrate conformable nanoimprint lithography (SCIL) - Trion Phantom 3 reactive ion etcher (RIE-ICP) - Zeiss Axioscope 5 optical microscope - AJA ATC-1300 F Sputtering - AJA ATC-1800 F Sputtering - AJA Orion-8 Sputtering - AnnealSys As-One 100 Rapid thermal processing - ELETTRORAVA PECVD - HOSITRAD PECVD - Resistive and e-beam evaporators - Speciality Coating PDS-2010 Parylene coater - “3 chamber” PECVD - “3 target” home-made sputtering - “Home-made” e-beam evaporator - “Pfeiffer” sputtering - FTIR – Thermo Nicolet 6700 - Luminescence Spectrometer - Perkin Elmer LS55 - Micro Plate Reader - Raman Microscope – Reninshaw Qontor - Spectrometer UV-Vis_NIR – Perkin Elmer Lambda 950 - Spectroscopic Ellipsometer - Horiba-Jobin Yvon - Sun Simulator - SPI 240A - TGA-DSC - STA 449 F3 Jupiter - X-ray diffraction – PANalytical Xpert PRO CHARACTERIZATION 3D Optical Profiler – Zygo Atomic Force Microscope – Bruker Edge Contact Angle Measurement – VCA Optima XE Electrical Test Station Microscope – Nikon LV150 Reflectometer – Filmetrics F20 Spectroscopic Ellipsometer – J.A. Woollam alpha-SE Stylus Profilometer – Veeco Dektak-8 DEPOSITION Atomic Layer Deposition – Arradiance GEMStar XT-P E-beam Evaporator – AJA Parylene Coater – SCS Labcoter2 Parylene Deposition System Plasma Enhanced Chemical Vapor Deposition (PECVD) – STS LpX CVD Sputter I – AJA Orion Sputter II – AJA Orion Thermal Evaporator – Denton Vacuum Explorer 14 ETCHING – ASHING Deep Reactive Ion Etcher (DRIE) – STS LpX Pegasus Plasma Cleaner – Samco PC-300 Reactive Ion Etcher (RIE) – Samco RIE-10NR Xenon Difluoride Etcher – Xactix FURNACES Furnace – Tystar Rapid Thermal Processor – AW-610 PACKAGING Laser Cutter – LPKF ProtoLaser R Wire Bonder -Ball- iBond5000 Wire Bonder – Wedge – West Bond 747677E PHOTOLITHOGRAPHY Convection Ovens – Blue M DCC-146-C-ST350 Develop Hood Mask Aligner – Suss MABA6 Mask Aligner – Suss MJB4 Maskless Aligner – Heidelberg MLA150 Maskless Aligner – Heidelberg uPG501 Microscope – Nikon LV150 Polyimide/SU8 Hood Spinner Hood Ultraviolet Flood Exposure System – Inpro Technologies F300S Vacuum Oven – YES WET PROCESSING Acid Hoods Critical Point Dryer – Tousimis Automegasamdri – 915B, Series C Ultrasonic and Megasonic Cleaners Characterization 1540XB FIB/SEM Stacks Image 173 Tencor P7 Profilometer Stacks Image 177 1530 SEM Stacks Image 175 Woollam Ellipsometer Stacks Image 179 Leica Stereozoom Stacks Image 183 Zeiss Axioskop Stacks Image 181 Mitutoyo Finescope Stacks Image 197 Lithography Neutronix-Quintel NXQ4006 Mask Aligner Stacks Image 107 Solitec 5110 coater/developer Stacks Image 111 Karl Suss MA6 Mask Aligner Stacks Image 109 CEE 200 spinner Stacks Image 113 Zeiss 1530 e-beam Lithography Stacks Image 117 Yield Engineering YES-3TA HMDS oven Stacks Image 115 Zeiss 1540XB FIB lithography Stacks Image 119 Innopsys Innostamp Stacks Image 121 Deposition Angstrom e-beam Deposition Stacks Image 91 IKO Electroplating Bench Stacks Image 95 Custom e-beam Deposition Stacks Image 93 Filgen Osmium Plasma Coater Stacks Image 97 STS PECVD Stacks Image 101 Edwards Auto500 Sputtering Stacks Image 99 Etching Trion Orion RIE Stacks Image 235 Miscellaneous Grey Lab Spinner Stacks Image 223 Ozone Cleaner Stacks Image 221 Spin Rinse Dryer Stacks Image 219 Dicing Saw Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Matrix 1107, Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher, Plasma Asher, Plasma Descum, Dry Clean, Downstream Asher,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics Aura 1000, Gasonics Aura 2000, Gasonics 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