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KEYWORDS: Mgage 200, Mgage 300, M-gage 200, M-gage 300,Sheet Resistant measurement, Metrology, Tencor M-Gage 300,Tencor M-Gage 200, sheet resistance, sheet resistance Measurement, Semiconductor Equipment, Semiconductor metrology Equipment, KLA-Tencor, Tencor

AWgage-150 Non-Contact Thickness/Resistance

ByMetal Film Metrology

AWgage-150 Non-Contact Thin Film Sheet Resistance Measurement Instrument. 2 to 6 inch wafers. 1mΩ/square to 19,990 Ω/square measurement range capability. Repeatability: 1-6±%.Mapping Function. Touch Screen. PC control

AWgage-200 Non-Contact Thickness/Resistance

ByMetal Film Metrology

AWgage-200 Non-Contact Thin Film Sheet Resistance Measurement Instrument. 3 to 8 inch wafers. 1mΩ/square to 19,990 Ω/square measurement range capability. Repeatability: 1-6±%.Mapping Function. Touch Screen. PC control

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AlN epitaxial layers,centrotherm c.OXIDATOR , high-temperature oxidation furnace , Rapid Thermal Processing system for silicon and compound semiconductors,c.RAPID 200,fully automatic loading system,centrotherm PECVD,c.PLASMA, c.DIFF,centrotherm highly versatile diffusion,wide band gap,c.CRYSCOO HTA,AP Systems,AP Systems Korea,KORONA RTP-12MP, KORONA RTP-12LPO , KORONA RTP-12LR/LPRR,Seebeck Coefficient / Electric Resistance Measurement System ZEM-3 series，Mini Lamp Annealer MILA-5050， Atmospheric Thermoelectric Module Evaluation System F-PEM，

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