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On August 2, 2017, the Countering America’s Adversaries Through Sanctions Act (CAATSA), became law and restricts entry into the United States, goods made wholly or in part by North Korean labor.  Section 321(b) of CAATSA amended the North Korea Sanctions and Policy Enhancement Act of 2016 by adding a new Section 302A, which creates a rebuttable presumption that goods made wholly or in part with North Korean labor are forced labor goods.…

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Utilities and Dimension of PE 4400 magnetron sputtering

Utilities and Dimension of  PE 4400 magnetron sputtering

  • Rear-mounted electrical, water, gas and LN2 inlet panel
  • Power distribution box
  • Water flow switch panel and manifold
  • DC or RF power supply: 208VAC, 60Hz, 3phases, 60A, 4 wires
  • Vacuum system: 208VAC, 60Hz, 3phases, 60A, 5 wires
  • Cooling Water: 1.8gpm3
  • Process N2: 60-70 psi
  • Process Argon: 5-10 psi
  • CDA: 40-60 psi
  • Dimension: 65″W x 46″D x 68″H
  • Weight: 2,288 lbs


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Plasma etching


Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals).

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