| AW-105R Plasma Asher Descum | AW-1008 Plasma Asher Descum | AW-B3000 Plasma Asher Descum |
| A9-0745-04-B.AW105R Service | A9-0725-01-C.AW1008-Technical | AW-B3000 Operations A9-0735-B.4 |
| A9-0745-03-B.AW105R Operation | AW1008-Operator A9-0726-01-A2 | |
| A9-0745-02-B.AW105R Installation | AW1008-Illustrated Parts Guide | |
| AW-901eR AW-903eR Plasma Etcher | AccuThermo AW 810 RTP | AccuThermo AW 410/610 RTP |
| 069-0710-03-C.7 AW-TGL Operation | A9-0716-C1.AW810M |
Archive | Others
| Allwin21 Corp. | AG Associates |
| Branson/IPC | Gasonics |
| Lam Research | Matrix |
| Perkin-Elmer | Tegal |
| MRC | Plasma-Therm |
| Optorun | Oxford |
| Allwin21 Corp. | AG Associates |
| Branson/IPC | Gasonics |
| Lam Research | Matrix |
| Perkin-Elmer | Tegal |
| MRC | Plasma-Therm |
| Optorun | Oxford |
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Win a free Apple Airpods at Allwin21 2019 MRS Fall
2019 MRS Fall Meeting & Exhibit (Allwin21 Booth: 229) on November 3rd to 5th 2019 Hynes Convention Center, Level 2 , 900 Boylston Street
Boston, Massachusetts 02115.
Exhibit Hours
Tuesday, December 3 | 11:00 am—5:30 pm
Wednesday, December 4 | 11:00 am—5:30 pm
Thursday, December 5 | 10:00 am—1:30 pm
Want a free Apple Airpods instantly?
…DECLARATION REGARDING NORTH KOREAN LABOR, FORCED LABOR AND HUMAN TRAFFICKING
PREAMBLE
On August 2, 2017, the Countering America’s Adversaries Through Sanctions Act (CAATSA), became law and restricts entry into the United States, goods made wholly or in part by North Korean labor. Section 321(b) of CAATSA amended the North Korea Sanctions and Policy Enhancement Act of 2016 by adding a new Section 302A, which creates a rebuttable presumption that goods made wholly or in part with North Korean labor are forced labor goods.…
test
Tegal 6510 plasma etcher
Tegal 6510 For: Polysilicon, Tungsten Silicide, Silicon Trench Reactor Type: HRe, up to 2 reactors, small footprint Wafer Sizes (inches): 4-8 Loadlocked
Utilities and Dimension of PE 4400 magnetron sputtering
Utilities and Dimension of PE 4400 magnetron sputtering
- Rear-mounted electrical, water, gas and LN2 inlet panel
- Power distribution box
- Water flow switch panel and manifold
- DC or RF power supply: 208VAC, 60Hz, 3phases, 60A, 4 wires
- Vacuum system: 208VAC, 60Hz, 3phases, 60A, 5 wires
- Cooling Water: 1.8gpm3
- Process N2: 60-70 psi
- Process Argon: 5-10 psi
- CDA: 40-60 psi
- Dimension: 65″W x 46″D x 68″H
- Weight: 2,288 lbs
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Plasma etching
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals).…