Gasonics Aura 3010/3000

Model: Gasonics Aura 3010/3000

OEM: Gasonics

Condition: Refurbished and Upgraded

Wafer Size: Up to 8 inch capability. 2 sizes without hardware change if optional. Customized.

Gases:O2 10SLM, N2 1SLM. Customized.

Wafer Transfer: Integrated solid robotic wafer transfer.

Cassette Station: Fixed, more stable.

Controller: Allwin21 PC with touch screen monitor.

Specifications: OEM

Valid Time: Subject to prior sale.


A downstream photoresist removal system. A damage-free Asher with closed loop temperature control. 5 – 8 inch (125mm-200mm) wafer capability.

Gasonics Aura 3010/3000 with Allwin21 PC controller Features:

  • Maintenance, Manual, Semi Automatic and Full Automatic operation modes
  • Automated calibration of all subsystems
  • Trouble shooting to sub-assembly levels
  • Programmed comprehensive calibration and diagnostic functions
  • Recipe creation for full automatic wafer processing
  • Automatic decline of improper recipes and process data
  • Multi level password protections
  • Storage of multiple recipes and system functions
  • Real-Time process data acquisition, display ,analysis
  • Real-Time graphics user display (GUI)
  • Process Data and Recipe storage on a hard drive
  • Advanced EOP function with SLOPE (optional)
  • GEM/SEC II functions (optional)
  • The robust integrated robotic wafer transfer (Video) instead of the original obsolete Z-bot
  • Fixed wafer cassette station instead of the original elevator.

Specifications for reference:

  • Pressure: 0.5 – >5.0 torr
  • Microwave Power: 0 – 1400 watt at 2.45 GHz
  • Wafer Temperature: 90-300 C°
  • Throughput:
    1. Bulk resist removal – 45-60 wph
    2. Implanted & damaged photoresist – 20-50 wph
  • Non-oxidizing metal processing – 40-60wph
  1. Descum – 45-60 wph.
  • Uniformity: (1 sigma, Ashed to 50% of >1.2μm resist)
    1. Within a wafer – 2%-5%
    2. Wafer to wafer – 2%-4% (average)
  • Ash rate: <200Å/min. to >3.5μm/min.
  • System matching: 2%-5% (1 sigma)
  • Mobile ion concentration: <1E10/cm2 μm