Tegal 901e Plasma Etcher Dry Etcher Semiconductor Process Equipment
Tegal 901e Plasma Etcher Dry Etcher Semiconductor Process Equipment (2)Tegal 901e Plasma Etcher Dry Etcher Semiconductor Process Equipment (1)Tegal 901e Plasma Etcher Dry Etcher Semiconductor Process Equipment (5)

Tegal 901e Plasma Etcher

Tegal 901e Plasma Etcher

Product Description

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Allwin21 Corp. has been focusing on providing solutions and enhancements toTegal 901eTegal 903eTegal 901e TTWTegal 903e TTW used plasma Etch RIE semiconductor process equipment. These OEM Etch RIE semiconductor equipment have been used in productions and R&D since 1990′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC, solid robotic wafer transfer system and new critical components to achieve the goal of giving our customers a production edge with right cost. 

 

The robust integrated robotic wafer transfer for Tegal 901e Tegal 90e

Tegal 901e Plasma Etch RIE

Manufacturer:Tegal | Condition:Fully Refurbished&Upgraded By Allwin21 | Wafer Size:3″/4″/5″/6″Capability |  Wafer loading: Automatic, Original Belt-Shuttle-Wafer-Transfer OR Allwin21 Solid-Robotic-Wafer-Transfer | Plasma Power:RF,13.56MHz | Type:Parallel/Single Wafer Process/Plasma Etch/RIE/Stand Alone | Etch Materials: Polysilicon, Refractory metal silicides and Nitride | Gas Lines:1~4 lines capability with customized MFCs range

Tegal 903e Plasma Etch RIE

Manufacturer: Tegal | Condition: Fully Refurbished&Upgraded By Allwin21 | Wafer Size: 3″/4″/5″/6″Capability |  Wafer loading: Automatic, Original Belt-Shuttle-Wafer-Transfer OR Allwin21 Solid-Robotic-Wafer-Transfer | Plasma Power: RF,13.56MHz | Type: Parallel/Single Wafer Process/Plasma Etch/RIE/Stand Alone | Etch Materials: Silicon Oxide | Gas Lines: 1~4 lines capability with customized MFCs range

Tegal 901e TTW Plasma Etch RIE

Manufacturer:Tegal | Condition:Fully Refurbished&Upgraded By Allwin21 | Wafer Size:3″/4″/5″/6″Capability |  Wafer loading: Automatic, Allwin21 Solid-Robotic-Wafer-Transfer | Plasma Power: RF,13.56MHz | Type:Parallel/Single Wafer Process/Plasma Etch/RIE/Through-The-Wall(TTW) | Etch Materials: Polysilicon, Refractory metal silicides and Nitride | Gas Lines:1~4 lines capability with customized MFCs range

 

Tegal 903e TTW Plasma Etch RIE

Manufacturer: Tegal | Condition: Fully Refurbished&Upgraded By Allwin21 | Wafer Size: 3″/4″/5″/6″Capability |  Wafer loading: Automatic, Allwin21 Solid-Robotic-Wafer-Transfer | Plasma Power: RF,13.56MHz | Type: Parallel/Single Wafer Process/Plasma Etch/RIE/Through-The-Wall(TTW) | Etch Materials: Silicon Oxide | Gas Lines: 1~4 lines capability with customized MFCs range

 

Tegal 901e Tegal 903e Upgrade Kits (Allwin21 Corp.)

The Upgrade kit for Tegal® 901e Tegal® 903e includes an advanced AW-900 System Control with touch screen operator interface or 17″ LCD Monitor , New PC with Allwin21 AW-900 software and new main control board. 

 

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