Fully refurbished and upgraded Tegal 903e Anisotropy Etch Facility Requirements. Allwin21 Corp. 12 months warranty.Electrical: 200-240 VAC
Archive | Article
Tegal 903e Dry Etcher Options
Fully Refurbished /upgraded Tegal 903e Dry Etcher Options:Robust Robotic Wafer Transfer Upgrade Kits, Through-The-Wall configuration,GEM/SEC II functions
Tegal903e Service and warranty
Fully Refurbished and upgraded Tegal903e Service and warranty: 12-Month Warranty by Allwin21 Corp. Available to extend service coverage after warranty
Tegal 903e Etcher Physical Specifications
Fully Refurbished and upgraded Tegal 903e Etcher ( by Allwin21 Corp. with 12 months warranty , on site installation / service) Physical Specifications
Tegal 903e Typical Proven Applications
Tegal 903e Applications: Oxide, SOG, PECVD Nitride (topside),Gases: CHF3,SF6, Helium, Pressure : 1600-3000 mTorr (Fully Refurbished and upgraded by Allwin21
Tegal 903e Basic System Configuration
Tegal 903e Basic System Configuration: Handles 75mm,100mm,125mm, 150mm Silicon or GaAs wafers ,round, fully refurbished and upgraded with 12 months warranty
TEGAL 9XX ( Tegal 901e Tegal 903e ) Introduction
The TEGAL 9XX ( Tegal 901e , Tegal 903e ) Plasma/RlE Etch Systems are used by the Semiconductor Industry for integrated circuit fabrication.
Configuration and Specification of Perkin-Elmer 4480 sputtering process system
Configuration and Specification of Perkin-Elmer 4480 sputtering process system:
| Items |
Perkin-Elmer 4450 uhv sputtering system |
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| Basic System |
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| Cathode Shape | Delta | ||
| Cathode Size | Delta | ||
| Cathode Port Amount | 1 to 3 | ||
| Cathode/Sputter Type | DC Magnetron (RF Magnetron, RF Diode, Pulse DC are optional) | ||
| DC Power Supply | 1-10 KW | ||
| RF Power Supply | 1-3 KW | ||
| Process Gases | Argon (200 SCCM) Standard, Up to 3 gas lines, MFC customized. | ||
Configuration and Specification of Perkin-Elmer 4450 uhv sputtering system
Configuration and Specification of Perkin-Elmer 4450 uhv sputtering system:
| Items |
Perkin-Elmer 4450 uhv sputtering system |
||
| Basic System |
|
||
| Cathode Shape | Delta | ||
| Cathode Size | Delta | ||
| Cathode Port Amount | 1 to 3 | ||
| Cathode/Sputter Type | DC Magnetron (RF Magnetron, RF Diode, Pulse DC are optional) | ||
| DC Power Supply | 1-10 KW | ||
| RF Power Supply | 1-3 KW | ||
| Process Gases | Argon (200 SCCM) Standard, Up to 3 gas lines, MFC customized. | ||
Configuration and Specification of Perkin-Elmer 4410 plasma sputtering systems
Configuration and Specification of Perkin-Elmer 4410 plasma sputtering systems: Delta Cathode, up to 3 cathodes, Cyropump, up to 3 process gases, Upgrated
Configuration and Specification of Perkin-Elmer 4400 vacuum deposition systems:
Configuration and Specification of Perkin-Elmer 4400 vacuum deposition systems:
| Items |
Perkin-Elmer 4400 |
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| Basic System |
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| Cathode Shape | Circular | ||
| Cathode Size | 8 inch | ||
| Cathode Port Amount | 1 to 4 | ||
| Cathode/Sputter Type | RF Magnetron (DC Magnetron, RF Diode, Pulse DC are optional) | ||
| DC Power Supply | 1-5 KW | ||
| RF Power Supply | 1-2 KW | ||
| Process Gases | Argon (200 SCCM) Standard, Up to 3 gas lines, MFC customized. | ||
Utilities and Dimension of PE 4480 reactive sputtering system
Utilities and Dimension of PE 4480 reactive sputtering system
- Rear-mounted electrical, water, gas and LN2 inlet panel
- Power distribution box
- Water flow switch panel and manifold
- DC or RF power supply: 208VAC, 60Hz, 3phases, 60A, 4 wires
- Vacuum system: 208VAC, 60Hz, 3phases, 60A, 5 wires
- Cooling Water: 1.8gpm3
- Process N2: 60-70 psi
- Process Argon: 5-10 psi
- CDA: 40-60 psi
- Dimension: 65″W x 46″D x 68″H
- Weight: 2,288 lbs
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Utilities and Dimension of PE 4450 thin film coatings
Utilities and Dimension of PE 4450 thin film coatings: Rear-mounted electrical, water, gas and LN2 inlet panel,DC or RF power supply,Vacuum system,panels
Utilities and Dimension of PE 4410 sputtering deposition
Utilities and Dimension of PE 4410 sputtering deposition:Rear-mounted electrical, water,gas and LN2 inlet panel,Power distribution box,switch panel,manifold
Vacuum Systems for Perkin-Elmer 4480
Vacuum Systems for the process chamber and loadlock of Perkin-Elmer 4450: 2 stage Cryopump with 1000 l/s pumping speed ,Chamber base pressure: 5X10-7 Torr.
