Tag Archives | PRODUCTS
Production-Proven Semiconductor Equipment Platforms
Allwin21 provides modernized semiconductor process equipment platforms for research labs, universities, compound semiconductor fabs, pilot production, and manufacturing environments.
Our main product areas include rapid thermal processing, plasma asher / descum, plasma etcher / RIE, sputtering deposition, thin film metrology, and upgrade kits for legacy semiconductor equipment.
The goal is simple: help customers keep proven process platforms productive while reducing obsolete hardware risk, improving operation, and supporting today’s fab requirements.
Production-Proven Platforms
Built around accepted semiconductor equipment architectures with real process history.
Modernized Hardware
Updated controls, electronics, subsystems, safety, and serviceability for long-term use.
Process-Driven Software
Control systems designed around repeatability, monitoring, diagnostics, and fab operation.
Lower Adoption Risk
Customers are not starting from random new designs or unproven process concepts.
Rapid Thermal Processing
Production-proven RTP platforms for annealing, oxidation, contact alloy, dopant activation, and compound semiconductor thermal processes.

Plasma Asher / Descum
Low-damage plasma platforms for descum, photoresist removal, residue cleaning, and sensitive semiconductor surface preparation.

Plasma Etcher / RIE
Production-proven dry etch platforms for plasma etching, RIE processes, compound semiconductor research, and production support.

Sputtering Deposition
Thin film deposition platforms for metal films, semiconductor process development, compound semiconductor devices, and production-proven sputter applications.

Thin Film Metrology
Precision film measurement platforms for semiconductor process monitoring, sheet resistance, film characterization, and lab-to-production metrology needs.

Upgrade Kits
Modern hardware and control upgrade solutions for production-proven semiconductor equipment platforms with obsolete electronics, controls, motion, RF, or interface systems.

Equipment Selection Is Not Always Straightforward
Choosing the right semiconductor equipment is not always straightforward. Similar applications can often be supported by different equipment platforms, process approaches, automation levels, and investment budgets.
The Right Solution Depends on the Application
Whether you are evaluating rapid thermal processing (RTP), plasma ashing, plasma etching, sputtering deposition, thin film metrology, or equipment upgrades, the best solution depends on your application objectives, process requirements, throughput expectations, facility conditions, and long-term support needs.
Why Work with Allwin21
With experience supporting universities, research institutes, compound semiconductor fabs, pilot production, and manufacturing environments, Allwin21 can help identify practical equipment solutions based on process requirements, business objectives, and long-term ownership considerations.
