Product Description
NSC-15, an optical thin film sputtering coater for mass-product, employs metal-mode-sputtering technique combined with a highly reactive plasma source. Load-lock system is equipped to achieve high throughput production.
Key Feature
- 4 kinds of target materials at maximum
- Replacement of cathode with other component
- Dual rotary cylindrical cathod for stable discharge
- High reactive plasma source for low absorption film
- Load-lock type substrate holder transfer system
Specifications
| Vacuum Chamber | LL Room: SUS304, W500 mm×D800 mm×H2890 mm PR Room: SUS304, φ1650 mm×H1200 mm |
| Substrate Holder | Selectable 13 – 22 pcs a holder |
| Rotary substrate drum system | φ1500 mm, Drum Type, 10 rpm – 100 rpm (Variable) |
| Reaction source | ICP (Inductively coupled plasma) |
| Sputtering source | Dual rotary cathode (Planner type as option) |
| Evacuation system | Roughing pump, Turbo molecular pump |
Performance
| Ultimate Pressure | LL chamber: 10 Pa PR chamber: ≤5.0 × 10-4 Pa |
| Pump Down Rate | LL chamber: ≤20 min (from atmospheric to 1.0×10-1 Pa) PR chamber: ≤40 min (from atmospheric to 5.0×10-3 Pa) |
| Setting substrate heating temperature |
150℃ as option |
Utility Requirements
| Layout Dimensions | 5800 mm (W) × 7700 mm (D)×3200 mm (H) |
| Power Requirements | 3-phase, 380V ± 10％、130kVA、50/60Hz |
| Cooling Water Flow Rate | 180ℓ/min or greater |
| Compressed Air Pressure | 0.5 MPa – 0.7 MPa |
| Gross Weight | 13000 kg approx. |
