Many customers ask for vacuum RTP because they believe vacuum means cleaner processing, lower oxygen, or better performance. Based on more than 45 years of RTP experience, Allwin21 recommends atmospheric RTP for most standard RTP applications unless the process truly requires reduced pressure.
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- Allwin21 Brochures: Rapid Thermal Processors
- Allwin21 Brochures: Sputtering Deposition Equipment
- Allwin21 Brochures: Plasma Asher Descum Equipment
- Allwin21 Brochures: Plasma Etcher RIE Equipment
- Allwin21 Brochures: Thin Film Metrology
- Allwin21 Brochures: All Products
- PPT on Why AccuThermo AW 610M RTP – 6″
- PPT on Why AccuThermo AW820M RTP – 8″
- PPT on Why do not buy RTP with vacuum function
- PPT on Why AW-105R Plasma Asher Descum – 6″
- PPT on Why AW-10R Plasma Asher Descum – 8″
- PPT on Why AW-B3000 Barrel Batch Manual Asher Descum – 8″
- PPT on Why AW-1008 Microwave Plasma Asher – 6″
- PPT on Why AccuSputter AW4450 Sputter Deposition Equipment – 8″
- PPT on Why AW-901eR AW-903eR Plasma Etcher – 6″
- PPT on Why AW-303R Plasma Etcher – 6″
- PPT on Why AWgage-150 AWgage-200 Metrology – 8″
- Video on Why AccuThermo AW610M atmospheric RTP
- Video on Why AccuThermo AW820R automatic atmospheric RTP
- Video on AW-105R Asher Descum
- Video on AW-1008 Plasma Asher
- Video on AW-B3000 Barrel Batch Plasma Asher
- Video on AW-901eR AW-903eR Plasma Etch
- Video on AccuSputter AW4450 Sputter Deposition Equipment
- Documents on our upgrade kits for Perkin-Elmer 2400, Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450, Perkin-Elmer 4480, Matrix 105 , Matrix 106, Matrix 303, Matrix 303, Matrix 403, Matrix 205, Matrix 101, Matrix 102, Matrix 103, Matrix 104,Tegal 901e, Tegal 903e, Lam Research LAM AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Branson/IPC 2000, Branson IPC 3000, Branson/IPC 4000, Gasonics Aura 3000, Gasonics Aura 3010, Gasonics L3510, Gasoncis Aura 1000, Gasonics AE 2001, AG Associates Heatpulse 610, AG Associates Heatpulse 410, AG Associates Minipulse 310, AG Associates Heatpulse 210
Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Matrix 105, Matrix 205, Matrix 303, Matrix 403,Matrix 106,Matrix 104, Matrix 102,Matrix 101, Matrix 10, System One Stripper, Model 105, System One Etcher, model 303, model 403,Plasma Asher, Plasma Descum, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Branson/IPC 2000, Branson/IPC 3000, Branson/IPC 4000, Barrel Asher, Barrel Etch, Barrel Etcher,Plasma Asher, Plasma Descum, Dry Clean, Downstream Asher,Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics Aura 1000, Gasonics Aura 2000, Gasonics Aura 3000, Gasonics L3510, Gasonics Aura 3010,Plasma Etcher, Please Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Tegal 901e, Tegal 903e, Tegal 901e TTW, Tegal 915,Tegal 701,Tegal 703,Tegal 801,Tegal 803,Tegal 981e,Tegal 903e,Plasma Etcher, Please Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790, Lam Rainbow 4400, Lam Rainbow 4420, Lam Rainbow 4428, Lam Rainbow 4500, Lam Rainbow 4520, Lam Rainbow 4528, Lam Rainbow 4600, Lam Rainbow 4620, Lam Rainbow 4628, Lam Rainbow 4700, Lam Rainbow 4720, Lam Rainbow 4728,Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics AE 2001, Microwave Etcher, Microwave Plasma Etcher, Microwave Etch, Downstream Plasma Etch,Rapid Thermal Process, Rapid Thermal Processing, Rapid Thermal Anneal, Rapid Thermal Annealing, Rapid Thermal Oxidation, Rapid Thermal Nitride, RTA, RTP, RTO, RTN,, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, AG210, AG310, AG 410, AG610, AG 610I, AG Associates, Heatpulse 210, Heatpulse 410, Minipulse 310, Heatpulse 610, Heatpulse 610I, AG Heatpulse 410, AG Heatpulse 610, AG Heatpulse 210, AG Minipulse 310, Atmospheric Rapid Thermal Process, Vacuum Rapid Thermal Process, Furnace, Oven, Thermal Furnace, Thermal Process, Thermal Processing,JIPELEC, ag2146,JetClip,JetStar, AST SHS2000, AST STEAG 2800, ssintegration, Rapid Thermal Oxide,JetFirst ,Mattson, annealsys, heatpulse ,ag 2146,Koyo Thermo Systems,AST STEAG-MATTSON 2800, heat pulse, Solaris, Eclipse ,modularpro, RLA-1000, AG Heatpulse, rapid thermal processor, Steag AST SHS2000, Solaris 75, Solaris75,STEAG Electronic Systems ,eng-sol, Annealsys, RLA-3000, Engineering Solutions ,Solaris 150, Rapid Thermal Annealer , AS-Master ,modularpro,RTO ,Modular Process Technology, Solaris150,AS-One,AS-Micro,Mgage 200, Mgage 300, M-gage 200, M-gage 300,Sheet Resistant measurement, Metrology, Tencor M-Gage 300,Tencor M-Gage 200, sheet resistance, sheet resistance Measurement, Semiconductor Equipment, Semiconductor metrology Equipment, KLA-Tencor, Tencor,Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450,Perkin-Elmer 4480, Perkin-Elmer 2400, Perkin Elmer 4400, Perkin Elmer 4410, Perkin Elmer 4450,Perkin Elmer 4480, Perkin Elmer 2400, Sputter, Magnetron Sputter, Diode Sputter, DC Sputter, RF Sputter, DC Magnetron Sputter, RF Magnetron Sputter, Co-sputter, Reactive Sputter, MRC, MRC 603, MRC 903, MRC 602, MRC 902, MRC 604, MRC 904, MRC 924, Plasma Etch, Dry Clean, Bias Function, Cathode, Load lock, Degas, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment,, Thin Film, Metal Thin Film, Thin Film Deposition, PVD, Physical Vapor Deposition …
FAQ on Rapid Thermal Processing Systems
FAQ on Rapid Thermal Processing Systems:
1. Q: Which model should I purchase?
A: Normally your biggest substrate size determines the model. AW 410 is up to 4 inch;AW 610,AW 610V are up to 6 inch; AW 810,AW 820, AW 820V are up to 8 inch.…
Gasonics Aura 3010 Plasma Asher
Gasonics Aura 3010 Plasma Asher is a single-wafer Photoresist Asher designed for ashing and cleaning semiconductor wafers of 5 to 8 inch diameters.
Rapid Thermal Processing (RTP)
Rapid Thermal Processing (RTP): Rapid Thermal Anneal (RTA), Rapid Thermal Oxidation (RTO), Rapid Thermal Nitridation (RTN) ,Rapid Thermal Diffusion (RTD)
Gasonics Aura 1000 Plasma Asher
Gasonics Aura 1000 Plasma Asher: Manufacturer: Gasonics Condition: Fully Refurbished and Upgraded by Allwin21 Wafer Size: 3"/4"/5"/6"Capability
Branson / IPC 4055/2 Plasma Surface Treatment Tool
Branson / IPC 4055/2 Plasma Surface Treatment Tool:Type:Barel/Batch Wafers Process,Desktop OR Stand Alone, Fully Refurbished and Upgraded by Allwin21 in USA
Branson/IPC S3100LP Asher Barrel Resist Strippers
Branson/IPC S3100LP Asher Barrel Resist Strippers: Maker : Branson/IPC Condition: Fully Refurbished and Upgraded by Allwin21 Wafer Size: Small~8"Capability
Branson/IPC S-3100 Barrel Resist Strippers
Branson/IPC S-3100 Barrel Resist Strippers:Manufacturer: Branson/IPC Condition: Fully Refurbished and Upgraded by Allwin21 Wafer Size: Small~8"Capability
Branson/IPC L3100/3 Barrel Resist Strippers
Branson/IPC L3100/3 Barrel Resist Strippers: Manufacturer: Branson/IPC ,Condition: Fully Refurbished and Upgraded by Allwin21,Wafer Size: Small~8"Capability
Branson/IPC P-2100 Barrel Resist Strippers
Branson/IPC P-2100 Barrel Resist Strippers:Manufacturer: Branson/IPC, Condition: Fully Refurbished and Upgraded by Allwin21 Wafer Size: Small~8"Capability
BRANSON/IPC 4000 Series
All our BRANSON/IPC 4000 Series go through a series of rigorous tests which are documented, standardized, and certified by performance and reliability standards.
Upgraded BRANSON/IPC 3000 Series
All Allwin21 BRANSON/IPC 3000 Series go through a series of rigorous tests which are documented, standardized, and certified by performance and reliability.
Etchers / Ashers: BRANSON / IPC 3000 Series
Etchers / Ashers: BRANSON / IPC 3000 Series: Fully refurbished and upgraded by Allwin21 Corp at 220 Cochrane Circle,Morgan Hill,CA95037 USA
Branson / IPC 3000C Barrel Stripper /Etcher (Branson / IPC 3000C)
Branson / IPC 3000C Barrel Stripper / Etcher (Branson / IPC 3000C) :
Manufacturer: Branson/IPC
Condition: Fully Refurbished and Upgraded by Allwin21
Wafer Size: Small~8″Capability
Wafer loading: Manually
Plasma Power: RF,13.56MHz
Type: Barel/Batch Wafers Process,Desktop OR Stand Alone
Gas Lines: 1 ~ 3 lines capability with customized MFCs range

All our Branson/IPC 3000 go through a series of rigorous tests which are documented, standardized, and certified by performance and reliability standards.…
