The Branson/IPC 3000 Series Plasma Systems generate a lowpressure, low temperature gaseous plasma. In this machine plasma reactions, such as ashing, etching, and polymer surface modification can be performed quickly and reproducibly. The machine comprises a source of RF electrical power, means for coupling the RF power into the plasma treatment chambers, and a system to control the flow of reactant plasma gases.
The reactor treatment chambers vary from model to model in this series. Each chamber has a hinged access door through which samples are inserted or removed. The door is sealed with a bell jar gasket. The RF generator in this series provides RF power, dynamically regulated to maintain constant level into a normal load or to limit power output if the load is removed.
Two separate units are provided which are interconnected by gas hoses and electrical cables. These are the RF GENERATOR and the REACTOR CENTER. The REACTOR CENTER contains the Reactor Chambers, the Gas Controls, RF Power Matching Controls, and Timer.
Branson/IPC 3000 Series Plasma Systems Specifications:
Specifications for the IPC 3000 Series of plasma machines depends on two sets of specifications for the two individual units which make up the system.
Allwin21 Corp.has been focusing on providing solutions and enhancements to Branson/IPC 3000, Branson/IPC L3200 used plasma Asher Descum semiconductor process equipment. These OEM semiconductor equipment have been used in productions and R&D since 1980′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC and new critical components to achieve the goal of giving our customers a production edge with right cost.
The Upgrade kit for Branson IPC® 2000, 3000, 4000 includes an advanced AW-B3000 System Control with touch screen operator interface , New PC with Allwin21 AW-B3000 software ,new main control board and new gas lines with MFCs.