Perkin-Elmer 4450 Sputter

Manufacturer: Perkin-Elmer
Condition: Fully Refurbished and Upgraded
Wafer Size: Small~8 inch
Wafer loading: Manual, with Load Lock
Cathodes: Delta Shape, 3 max
Sputter Methods: DC/RF; Diode/Magnetron
Gas Lines: 1~3 MFCs

Free Fast Quote: Link


Perkin Elmer 44xx (PDF)

With an installed base of more than thousands of systems, Perkin-Elmer was a leading supplier of sputter deposition equipment for high technology application in 1990’s. The Perkin-Elmer 4450 Sputter Deposition Systems, fully refurbished and upgraded by Allwin21 Corp., were designed for flexibility offering a wide range of operating and process modes. The highest quality construction, components and Allwin21’s new AW-4450 System Control assure reliable operation and an ultra clean vacuum environment to yield consistently reproducible results. Every fully refurbished and upgraded Perkin Elmer sputtering system was supported by years of technological experience and backed by a worldwide sales and service organization dedicated to prompt courteous service.

The Perkin-Elmer 4450 Sputter Deposition System is a manually-loaded system capable of fully automatic operation. The The Perkin-Elmer 4450 Sputter Deposition System sputtering head is equipped with three (3) Delta™ cathode positions, one (1) of which may be fitted with an in-process heater fixture in place of a target. Using optional adaptors, the cathode apertures can also accept 8″ round targets. (Mo flame sprayed shields and shutters standard; W-C flame sprayed shields and shutters-optional.)

All our Perkin-Elmer 4450 Sputter Deposition Systems go through a series of rigorous tests which are documented, standardized, and certified by performance and reliability standards. By strictly following these procedures, the customer receives guaranteed rapid start-up, lifecycle reliability, and proven process performance.

Key Features

  • Process Proven for III-V substrates
  • Non-PLC (Smaller footprint / easy maintenance)
  • 20 years proven sputter technology
  • New optimum AW-4450 System Control
  • Efficient DeltaTM cathode
  • Up to 3 pieces of DeltaTM cathode ports
  • High throughput operation
  • High Uniformity and Yield
  • DC, RF Sputter
  • Magnetron and Diode Sputter option
  • RF Etch and Bias are optional
  • Ultra Clean vacuum system
  • Load lock operation
  • UHV design
  • Flexible for development or production use
  • Full range of substrate sizes and shapes
  • Various pumping and power options
  • Co-sputtering option
  • Reactive Sputtering option

AW-4450 System Controller

  • Maintenance, Manual, Semi Automatic and Full Automatic operation modes
  • Automated calibration of all sub-systems
  • Trouble shooting to sub-assembly levels
  • Programmed comprehensive calibration and diagnostic functions
  • Recipe creation for full automatic wafer processing
  • Automatic decline of improper recipes and process data
  • Multi level pass word protections
  • Storage of multiple recipes and system functions
  • Real-Time process data acquisition,display ,analysis
  • Real-Time graphics use display
  • Process Data and Recipe storage on a hard drive
  • Easy TC vacuum gauge calibration
  • Positioning Deposition(optional)
  • GEM/SEC II functions (optional)

Screen of Perkin-Elmer 4450 Sputter Desposition System

Screen of Perkin-Elmer 4450 Sputter Deposition System

Approved Processes and Applications of   Perkin-Elmer 4450 Sputter Deposition System

Al+W Cr/SiO2 SiC Ti+Au
InSnO SiO2 Ti/W Ti+Au+Ni
Al2O3 Mo SiO2+O2 Ni/Fe+Cu+SiO2
Ag MoSi2 Si+N2(Si3N4) Ti/W+Au
Au Mo2Si5 Si+N2+B4C Ti/W+Au+Ta
C Mo5Si3 Ta Ti/W+Al/Si
Cr Ni TaC Ti/W+Ni/Cr+Au
Cr/Co Ni/Cr Ta+Au Ti/W+Pt
Cr/Au Ni+Ni/Cr TaSi2 Al+Ti/W+Ag
Cr+Cu Ni/Fe Ta+SiO2 W+Al2O3
Cr/Si Pt Zr Zn
Cr/SiO TiO2 TiO2+Cr ZnO2
Contact Us for More Information

Perkin-Elmer and related trademarks belongs to Perkin-Elmer company.

“>KEYWORDS: Perkin-Elmer 4400, Perkin-Elmer 4410, Perkin-Elmer 4450,Perkin-Elmer 4480, Perkin-Elmer 2400, Perkin Elmer 4400, Perkin Elmer 4410, Perkin Elmer 4450,Perkin Elmer 4480, Perkin Elmer 2400, Sputter, Magnetron Sputter, Diode Sputter, DC Sputter, RF Sputter, DC Magnetron Sputter, RF Magnetron Sputter, Co-sputter, Reactive Sputter, MRC, MRC 603, MRC 903, MRC 602, MRC 902, MRC 604, MRC 904, MRC 924, Plasma Etch, Dry Clean, Bias Function, Cathode, Load lock, Degas, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment,, Thin Film, Metal Thin Film, Thin Film Deposition, PVD, Physical Vapor Deposition