Product Description
This machine is a large-scale optical thin film coater for antismudge(AS), anti-reflection(AR), and AS+AR coatings.
Key Feature
- Excellent uniformity by the center drive substrate rotation system.
- RF ion source to enhance abrasion resistance (subject to more than forty thousand abrasion test*) . The cycles of abrasion can be varied according to standard of wear resistance test.
- Mass production for AS coating.
Specifications
| Chamber Size | φ 2350mm × H1400mm |
| Substrate Dome | φ 2200mm, Five-sectional |
| Max. Dome Rotation Speed | 20rpm |
| Crystal Film Thickness Monitor | 6-point Crystal flim monitor |
| Evaporation Source | One unit of EB source, Movable AS source |
| Ion Source | RF Ion Source |
Performance
| Ultimate Pressure | 7.0E-5Pa or lower |
| Pumping Speed | 15 min (from atmospheric pressure to 2.0×10-3 Pa） |
Utility Requirements
| Installation Space | 6300 (W) ×9000 (D) ×4000mm (H) |
| Power Source | 3-phase, 200V, 50/60Hz, 80kVA, approx. |
| Minimum Water Flow | 220ℓ /min |
| Air Pressure | 0.5 – 0.7 MPa |
| Weight | 12000kg, approx. |
