Suitable for mass production of AR coating.
- Excellent uniformity by the center drive substrate rotation system.
- Shortened coating tact time achieved by higher performance in pumping and heating.
- Optical monitor, DC ion source, and Resistance heater evaporation source can be optionally installed.
|Chamber Size||SUS304, φ1300mm×1500mm (H)|
|Substrate Dome||Four-sectional Dome (orφ1200mm)|
|Max. Dome Rotation Speed||30 rpm (Variable)|
|Crystal Film Thickness Monitor||XTC/3 plus 6-point rotary sensor|
|Evaporation Source||One unit of EB source|
|Ultimate Pressure||7.0 × 10-5 Pa or lower|
|Pumping Speed||10 min (from atmospheric pressure to 3.0×10-3 Pa)|
|Max. Substrate Heating Temp.||350 ℃|
|Installation Space||4500mm (W)×6000mm (D)×3200mm (H)|
|Power Source||3-phase, 200V, 50/60Hz, 80kVA, approx.|
|Minimum Water Flow||100ℓ/min|
|Air Pressure||0.5 – 0.7 MPa|