Product Description

Suitable for mass production of AR coating.

Key Feature

  • Excellent uniformity by the center drive substrate rotation system.
  • Shortened coating tact time achieved by higher performance in pumping and heating.
  • Optical monitor, DC ion source, and Resistance heater evaporation source can be optionally installed.


Chamber Size SUS304, φ1300mm×1500mm (H)
Substrate Dome Four-sectional Dome (orφ1200mm)
Max. Dome Rotation Speed 30 rpm (Variable)
Crystal Film Thickness Monitor XTC/3 plus 6-point rotary sensor
Evaporation Source One unit of EB source


Ultimate Pressure 7.0 × 10-5 Pa or lower
Pumping Speed 10 min (from atmospheric pressure to 3.0×10-3 Pa)
Max. Substrate Heating Temp. 350 ℃

Utility Requirements

Installation Space 4500mm (W)×6000mm (D)×3200mm (H)
Power Source 3-phase, 200V, 50/60Hz, 80kVA, approx.
Minimum Water Flow 100ℓ/min
Air Pressure 0.5 – 0.7 MPa
Weight 6500kg, approx.