Product Description
Suitable for mass production of AR coating.
Key Feature
- Excellent uniformity by the center drive substrate rotation system.
- Shortened coating tact time achieved by higher performance in pumping and heating.
- Optical monitor, DC ion source, and Resistance heater evaporation source can be optionally installed.
Specifications
| Chamber Size | SUS304, φ1300mm×1500mm (H) |
| Substrate Dome | Four-sectional Dome (orφ1200mm) |
| Max. Dome Rotation Speed | 30 rpm (Variable) |
| Crystal Film Thickness Monitor | XTC/3 plus 6-point rotary sensor |
| Evaporation Source | One unit of EB source |
Performance
| Ultimate Pressure | 7.0 × 10-5 Pa or lower |
| Pumping Speed | 10 min (from atmospheric pressure to 3.0×10-3 Pa) |
| Max. Substrate Heating Temp. | 350 ℃ |
Utility Requirements
| Installation Space | 4500mm (W)×6000mm (D)×3200mm (H) |
| Power Source | 3-phase, 200V, 50/60Hz, 80kVA, approx. |
| Minimum Water Flow | 100ℓ/min |
| Air Pressure | 0.5 – 0.7 MPa |
| Weight | 6500kg, approx. |
