OTFC-1100 Optical Thin Film Coater

Product Description

OTFC series, based on the ion-assisted technology, are the most suitable coating system for producing AR coatings and optical filters such as edge filters, band pass filters etc.

Key Features

    • Chamber size: φ 600mm-φ1800mm
    • 60-point optical thickness monitor.
    • RF ion source achieving uniformed, larger ion beam distribution over a larger area at high ion current density.
    • Over 100 layers can be deposited by 2 EB guns and multi-point crucible hearth or annular hearth.
    • Auto-deposition control system for fully automated process.
    • Center-driving or planetary substrate dome is selectable.
    • Diffusion pumps plus Polycold or Cryo- pumps.


Model OTFC-1100CBI/DBI
Vacuum Chamber SUS304, φ1100mm×1520mm (H)
Substrate Dome Size φ950mm
Substrate Dome Rotation Speed 10 rpm to 50 rpm (Variable)
Optical Film Thickness Control System HOM2-R-VIS350A High-precision Optical Monitor
Wavelength range: 350nm to 1100nm
Crystal Film Thickness Monitor XTC/3 plus 6-point rotary sensor
Evaporation Source EB source: 2 units
Ion Source 17cm RF Ion Source
Vacuum System Roughing Pump, 2 Diffusion Pumps + Polycold
Or 2 Cryo Pumps + Cryo Trap


Ultimate Pressure 7.0×10-5Pa or lower
Pump Down Rate 15 min (Atm. to 1.3×10-3Pa)
Substrate Heater 350℃ (max.)


Layout Dimensions 5000mm (W)×6000mm (D)×3300mm (H) approx.
Power Requirements 3-phase, 200V, 50/60Hz, 100kVA approx.
Cooling Water Flow Rate 120ℓ/min or greater
Compressed Air Pressure 0.5MPa or greater
Gross Weight 7200kg approx.