The RPD series is a reactive plasma deposition system and can mass-produce high performance, functional LED films (ITO and AlN) at low cost.
- Realizing both activation and evaporation of deposition materials by employing a reactive plasma source.
- High quality crystalline film by applying optimum energy.
- Mass-production at low temperature and low cost.
|Chamber Size||1000 mm × H1165 mm|
|Substrate Dome||φ 870 mm|
|Max. Dome Rotation Speed||10 – 30 rpm|
|Crystal Flim Thicness Monitor||6 point rotary sensor|
|Ion Source||Reactive Plasma Source|