Product Description
Electron Source
Its high current density is remarkably effective at increasing plasma density and preventing the plasma process from charge-up.
Long time stability and less contamination in the oxygen process achieved by RF excitation. Two sources can be controlled simultaneously.
Specifications
| Neutralizer | RFN-3A |
| Emission | 3000mA |
| Max RF Power | 150W |
| Controller | OIS-ESC |
| Neutralizer DC | OISN-Ⅱ |
| Neutralizer RF | AX300Ⅲ (300W) |
