OIS-ES

Category: Tags: ,

Product Description

Electron Source

Its high current density is remarkably effective at increasing plasma density and preventing the plasma process from charge-up.
Long time stability and less contamination in the oxygen process achieved by RF excitation. Two sources can be controlled simultaneously.

Specifications

Neutralizer RFN-3A
Emission 3000mA
Max RF Power 150W
Controller OIS-ESC
Neutralizer DC OISN-Ⅱ
Neutralizer RF AX300Ⅲ (300W)