RF Ion Source
OIS-Three/OIS-Three Plus has an incomparable high power beam to any other ion beam assisted deposition systems.
Uniform irradiation covers an entire dome with 1600 in diameter.
OIS-Three/OIS-Three Plus is most suitable for mass production of sophisticated optical filters when equipped with OTFC-1800.
- Newly developed grid has long life.
- Long life and less contamination.
- Higher uniformity of ion density with a wide coverage over a dome with 1600mm in diameter.
- Great stability and non-stop operation for longer hours.
|Dimensions||φ 390mm × 215mm(H)|
|Grids||φ 23cm three molybdenum grids|
|Beam Voltage||100V – 1500V|
|Max Beam Current||1800mA||2400mA|
|Acc Voltage||100V – 1000V|
|Max RF Power||2000W|
|Gas Flow Rate||20sccm – 40sccm (argon)
40sccm – 80sccm (oxygen)
|Pressure||5 × 10-2 Pa|
|Water-cooling||RF coil and beam unit|
|Dimensions||φ 7cm × 12cm|
|Max Emission Current (max）||2800mA||3000mA|
|Max RF Power||150W|
|Gas Flow Rate||5sccm to 10sccm (argon only)|