RF Ion Source
OIS-Four is a compact but high performance RF ion source specially designed for IAD coating system and suitable for vacuum coating and substrate cleaning at high rate.
The 10cm grid is small, but enables dense, uniform radiation over entire dome of our OTFC-600 and OTFC-900.
Most suitable for test coatings of optical filters, medium-sized production and R&D purpose.
- Long life and less contamination compared with other ion sources using consumables such as filament.
- High uniformity of ion density distribution, power and board coverage of evaporation over 800mm dia.
- Highly stable and long operation hours.
|Dimensions||φ 224mm ×143mm (H)|
|Grids||φ 10cm three molybdenum grids|
|Beam Voltage||100V – 1500V|
|Max Beam Current||500mA|
|Acc Voltage||100V to 1000V|
|Max RF Power||600W|
|Gas Flow Rate||25sccm – 35sccm (oxygen)
10sccm – 20sccm (argon)
|Pressure||5.0 ×10-2 Pa|
|Water-cooling||RF coil and main unit|
|Dimensions||φ 6cm × 8cm|
|Max Emission Current||1500mA|
|Gas Flow Rate||5sccm to 8sccm (argon only)|