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Branson/IPC 3000 Branson/IPC 2000 Branson/IPC 4000 Faraday cage

Faraday cage

Branson/IPC 3000 Branson/IPC 2000 Branson/IPC 4000 AW-B3000 Faraday cage

Category: Branson/IPC 3000 Spare Parts

Description

Product Description

Branson/IPC 3000 Branson/IPC 2000 Branson/IPC 4000 AW-B3000 Faraday cage. Please contact us for more information.

Allwin21 Corp. has been focusing on providing solutions and enhancements to Branson/IPC 3000, Branson/IPC L3200 used plasma Asher Descum semiconductor process equipment. These OEM semiconductor equipment have been used in productions and R&D since 1980′s. They have been proven to be a true “work horse”. Allwin21 Corp. can customize these OEM systems with Allwin21′s comparable integrated process control system with PC and new critical components to achieve the goal of giving our customers a production edge with right cost.

AW-B3000 Plasma Asher

byPlasma Asher Descum Equipment

Manufacturer: Allwin21 | Condition: New | Wafer Size: Small~8″Capability | Wafer loading: Manually | Plasma Power: RF,13.56MHz | Type: Barel/Batch Wafers Process,Desktop OR Stand Alone | Gas Lines: 1 ~ 3 lines capability with customized MFCs range

Branson_IPC

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Branson/IPC 3000 Upgrade

byUpgrade Service

The Upgrade kit for Branson IPC® 2000, 3000, 4000 includes an advanced AW-B3000 System Control with touch screen operator interface , New PC with Allwin21 AW-B3000 software ,new main control board and new gas lines with MFCs.

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RTP RFQ
Sputter RFQ
Asher RFQ
Etch / RIE RFQ
Metrology RFQ
Upgrade Kits RFQ
RTP / Asher Test Demo

Rapid Thermal Process

	AccuThermo AW610M ~6″ Semi-Auto RTP
	AccuThermo AW820M ~8″ RTP
	AccuThermo AW820R ~8″ Automatic RTP
	AccuThermo AW820V Vacuum RTP
	AccuThermo AW820RV Auto Vacuum RTP
	AccuThermo RTP-3000 12″ Automatic RTP

Plasma Ash / Descum

	AW-105R Low RF Damage Asher
	AW-10R ~8″ Plasma Asher
	AW-1008 ~6″ Plasma Asher
	AW-B3000 Manual / Batch Asher

Plasma Etch / RIE

	AW-901eR Plasma Etcher / RIE
	AW-903eR Plasma Etcher / RIE
	TTW AW-901eR TTW Plasma Etcher
	TTW AW-903eR TTW Plasma Etcher
	AW-303R Low Plasma Damage
	AW-2001R ~6″ Plasma Etcher

Sputter / Metrology

AccuSputter AW4450

Sputter Deposition

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AWgage-150

Thin Film Metrology

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AWgage-200

Thickness / Resistance

Videos / Downloads

Product PPTs
Product Demo Videos

Semi Membership

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Technologies F300S Vacuum Oven – YES WET PROCESSING Acid Hoods Critical Point Dryer – Tousimis Automegasamdri – 915B, Series C Ultrasonic and Megasonic Cleaners Characterization 1540XB FIB/SEM Stacks Image 173 Tencor P7 Profilometer Stacks Image 177 1530 SEM Stacks Image 175 Woollam Ellipsometer Stacks Image 179 Leica Stereozoom Stacks Image 183 Zeiss Axioskop Stacks Image 181 Mitutoyo Finescope Stacks Image 197 Lithography Neutronix-Quintel NXQ4006 Mask Aligner Stacks Image 107 Solitec 5110 coater/developer Stacks Image 111 Karl Suss MA6 Mask Aligner Stacks Image 109 CEE 200 spinner Stacks Image 113 Zeiss 1530 e-beam Lithography Stacks Image 117 Yield Engineering YES-3TA HMDS oven Stacks Image 115 Zeiss 1540XB FIB lithography Stacks Image 119 Innopsys Innostamp Stacks Image 121 Deposition Angstrom e-beam Deposition Stacks Image 91 IKO Electroplating Bench Stacks Image 95 Custom e-beam Deposition Stacks Image 93 Filgen Osmium Plasma Coater Stacks Image 97 STS PECVD Stacks Image 101 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AlN epitaxial layers,centrotherm c.OXIDATOR , high-temperature oxidation furnace , Rapid Thermal Processing system for silicon and compound semiconductors,c.RAPID 200,fully automatic loading system,centrotherm PECVD,c.PLASMA, c.DIFF,centrotherm highly versatile diffusion,wide band gap,c.CRYSCOO HTA,AP Systems,AP Systems Korea,KORONA RTP-12MP, KORONA RTP-12LPO , KORONA RTP-12LR/LPRR,Seebeck Coefficient / Electric Resistance Measurement System ZEM-3 series，Mini Lamp Annealer MILA-5050， Atmospheric Thermoelectric Module Evaluation System F-PEM，