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AccuThermo AW 410 RTP

ByAtmospheric Rapid Thermal Process, Rapid Thermal Process Equipment
Manufacturer: Allwin21 Corp.
Condition: New
Wafer Size: Small~4 inch
Type: Desktop, Atmospheric
Temperature: 100~800°C or 450~1250°C
Gas Lines: 1 ~ 6 lines
Chamber Design: AG Associates Heatpulse 410
Downloads:
AccuThermo AW-410 (PDF)
Rapid Thermal Process (PPT)

AW-410

AG_Std

Allwin21 Corp. is the exclusive licensed manufacturer of AG Associates Heatpulse 610 Rapid Thermal Processing tool.

AccuThermo AW 410 Overview:

The AccuThermo AW410 is a rapid thermal processing (RTP) system, which uses high intensity visible radiation to heat single wafers for short process periods of time at precisely controlled temperatures. The process periods are typically 1‑600 seconds in duration, although periods of up to 9999 seconds can be selected.

These capabilities, combined with the heating chamber’s cold-wall design and superior heating uniformity, provide significant advantages over conventional furnace processing.

The AccuThermo RTP AW 410 rapid thermal annealing system consists of an oven unit and a controller computer running the Allwin21 RTAPRO controller software. The wafer to be processed is placed on a quartz tray that slides into a quartz isolation tube in the oven unit. Four banks of lamps, two above the quartz tube and two below it, provide the source of energy for heating the wafer. The lamps can be controlled manually and automatically from the controller computer.

The RTAPRO control software allows full control and diagnostics of the AccuThermo RTP system.  In addition, it allows the creation of recipes for automated control of the temperature and, optionally, process gas flow.

The control software uses a set of operating instructions known as recipes to automatically control the AccuThermo RTP system. These recipes are created by the Process Engineer to monitor and control the parameters of the processing cycle. The Operator then uses the software to select and run the process parameters (steady state temperature, process time, ramp rates, etc.).

The RTAPRO software is also used to create, delete, copy, modify and store the recipes and to execute system diagnostics.

AccuThermo AW 410 Key Features:

  • Heating chamber’s cold-wall design with gold plating finish which has been approved in 30 years  (►).
  • Atmospheric Rapid Thermal Annealing system with Top and bottom IR lamp heating for superior heating uniformity (►).
  • Closed-loop temperature control with pyrometer (No-Contact) or thermocouple temperature sensing (►).
  • Precise time-temperature profiles tailored to suit specific process requirements (►).
  • Fast heating and cooling rates unobtainable with conventional technologies.
  • Consistent wafer-to-wafer process cycle repeatability which is the most important characteristic of rapid thermal annealing systems.
  • Elimination of external contamination with isolated quartz tube.
  • Small footprint and energy efficiency.
  • Software which integrates all of the Process Control into a single reliable software package (►).
    • GUI interface (►).
    • Real-Time process data acquisition (►).
    • Real-Time graphics (►).
    • Process Data Analysis  (►).
    • Process Data and Recipe storage on a hard drive (►).
    • Recipe Editor for Multi-step Processing (►).
    • Easy Recipe Editor (►).
    • System Diagnostics function (►).
    • Chamber calibration data for smooth control (►).
    • Easy software pyrometer calibration (►)
    • Easy software gas calibration (►)
    • Easy software thermocouple calibration (►)
    • Power summary function for better performance repeatability control (►).
    • More IO AD DA hardware exposed for easier maintenance and trouble shooting (►)
    • The watchdog timer shuts down the lamps to prevent run-away heating of the wafer.

Applications

The AccuThermo RTP system is a versatile tool that is useful for many applications:

  • Ion Implant Activation
  • Polysilicon Annealing
  • Oxide Reflow
  • Silicide Formation
  • Contact Alloying
  • Oxidation and Nitridation
  • GaAs Processing

Heating, Cooling, and Temperature Measurement

The following list contains the key features of the AccuThermo AW 410 RTP system heating, cooling and temperature measurement systems:

  • High-intensity visible radiation heats wafers for short periods of 1 to 9999 seconds at precisely controlled temperatures in the 400°C to 1200°C range. (1 to 600 second heating periods are used typically.)
  • Tungsten halogen lamps and cold heating chamber walls respectively allow fast wafer heating and cooling rates.
  • The system delivers time and temperature profiles tailored to suit specific process requirements.
  • Pyrometer or thermocouple sensing offers precise closed-loop temperature control.
  • Cooling N2 flows around the lamps and quartz isolation tube
  • MFC controlled gases (up to four) flow through the heating chamber for purge and/or process purposes.

 

AccuThermo AW 410 Configuration:

  1. AW 410/610 Main Frame with wires.

  2. Aluminum chamber with water cooling and gold plating.

  3. Isolated Quartz Tube without window.

  4. Oven control board and main control board

  5. Bottom and top heating with 17 (1.5 KW ea) Radiation heating lamp module with 4 bank zones (Top Front&Rear,Bottom Front&Rear).

  6. Quartz Tray for 2 to 4 inch round (or square)  wafer

  7. One gas line with one MFC without shut-off valve.

  8. Computer with AW Software, 17” LCD Monitor, Mouse, Standard Keyboard

  9. T Shape Quartz with TC and one Quartz holder for 100-800°C

  10. One package of 5 pieces of thermocouple wires

  11. One USB with original Software backup

AccuThermo AW 410 Options:

    1. Quartz Tray
    2 ~ 4 inch round wafer2 ~4 inch square waferCustomized Quartz Tray
    2. Patented ERP Pyrometer for noncontact Temperature Sensor For 400-1250°C
    ERP Pyrometer SensorQuartz Tube with Window for PyrometerChiller for ERP PyrometerTC Wafer for Pyrometer CalibrationOmega Meter CL23A for Pyrometer Calibration
    3. More gas lines with gas box, shut-off valve and gas PCB
    2 gas line with MFC3 gas lines with MFCs4 gas lines with MFCs5 gas lines with MFCs6 gas lines with MFCsCustomized
    4. Susceptor or carrier (Base &Cover or Base or Cover) for transparent, small pieces, metal thin film substrate
    Silica with SiC coating for up to 2 inch round waferSilica with SiC coating for up to 3 inch round waferSilica with SiC coating for up to 4 inch round waferGraphite with SiC coating for up to 3 inch round waferGraphite with SiC coating for up to 4 inch round waferSiC for up to 2 inch round waferSiC for up to 3 inch round waferSiC for up to 4 inch round waferCustomized
    5. GEM/SEC II function
    6. 2nd Thermocouple for temperature monitoring (Not recommended)
    7. Customized options.

    AccuThermo AW 410 Specification:

    • Wafer handling:  Manual loading of wafer into the oven, single wafer processing.
    • Wafer sizes: 2″, 3″, 4″ wafers.
    • Ramp up rate:  Programmable, 10°C to 200°C per second.
    • Recommended steady state duration: 0-300 seconds per step.
    • Ramp down rate:  Programmable, 10°C to 250°C per second.  Ramp down rate is temperature-and-radiation-dependent and the maximum is 125°C per second.
    • Recommended steady state temperature range:  150°C – 1150°C
    • ERP temperature accuracy:  ±1°C, when calibrated against an instrumented thermocouple wafer (ITC).
    • Thermocouple temperature accuracy:  ±0.5°C
    • Temperature repeatability: ±0.5°C or better at 1150°C wafer-to-wafer.  (Repetition specifications are based on a 100-wafer set.)
    • Temperature uniformity: ±5°C across a 4″ (100 mm) wafer at 1150°C.  (This is a one sigma deviation 100 angstrom oxide.)  For a titanium silicide process, no more than 4% increase in non-uniformity during the first anneal at 650°C to 700°C.
    • Process/Purge gas inputs: Any inert and/or non-toxic gas regulated to 30 PSIG and pre-filtered to 1 micron.  Typically, Nitrogen (N2), oxygen (O2), argon (Ar), and/or helium (He) are used.

    AccuThermo AW 410 Gallery:

    AccuThermo AW 410 Facility:

    1. Dimension and Weight

    Equipment

    		 Diminsions

    Weight
    Single Gas Line 10.5″ H x 18″ W x 17″ D 100 LBS
    2 to 4 gas lines 10.5″ H x 26″ W x 17″ D 150 LBS
    5 to 6 gas lines 10.5″ H x 29.75″ W x 17″ D 150 LBS
    Pyrometer Chiller 28″ H x 10.75″ W x 19″ D 50 LBS

    Data for shipping reference:

    Option No. Description Dimension

    (L X W X H) Gross Weight

    (lbs)Net  Weight

    (lbs)1Single Gas Line without Pyrometer Chiller31″ X 30″ X 32″  O.D.1501002Single Gas Line with Pyrometer Chiller39″ X 30″ X 34″  O.D.2251503Multiple Gas Line without Pyrometer Chiller33″ X 30″ X 32″  O.D.1801304Multiple Gas Line without Pyrometer Chiller44″ X 33″ X 34″  O.D.275200

    2. Air Conditioning:  The moisture in the ambient air around the AccuThermo RTP should not condense on any part of the system. Temperature is 20-30°C and humidity is Non-condensing.

    3. Electrical

    Power requirements vary between the United States, Europe and Japan.  It also varies if the system is constructed as a single phase or 3-phase unit.  Specifications for each are shown in the tables below. 

    USA
    voltage: 208 VAC (240 VAC optional)
    # phases: 3-phase
    # wires: 3 supply, 1 neutral and 1 ground
    current: 50 Amp maximum power consumption
    frequency: 60 Hz

     
    Europe
    voltage: 380 VAC (415 VAC optional)
    # phases: 3-phase
    # wires: 3 supply, 1 neutral and 1 ground
    current: 50 Amp maximum power consumption
    frequency: 50 Hz

     
    Japan
    voltage: 200 VAC
    # phases:

    3-phase
    # wires:

    3 supply and 1 ground
    current: 50 Amp maximum power consumption
    frequency: 50/60 Hz

     
    • Separate power distribution box with slow trip circuit breakers are required.
    • Locate the separate power disconnect box within easy reach.
    • Total AC power line length should not exceed 25 feet
    • An isolation transformer is recommended to reduce interference to other equipment.

    Accessories Requirements

    Specification

    Equipment

    Voltage

    Frequency

    Current

    Notes

    USA

    Chiller

    110-120

    60 Hz

    11 A

    1

    Computer

    110-120

    60 Hz

    Variable

    2

    Europe

    Chiller

    220-240

    50 Hz

    5.5 A

    1

    Computer

    220-240

    50 Hz

    Variable

    2

    Japan

    Chiller

    100

    50/60 Hz

    11 A

    1

    Computer

    100

    50/60 Hz

    Variable

    2

    Note 1: 2 supply wires and 1 ground wire

    Note 2: Computer current will be dependent upon the computer manufacturer.

    4. Cooling

    The heating chamber incorporates three cooling subsystems:

    • A nitrogen or air cooling system to reduce residual heating of the quartz isolation tube and lamps.
    • A water cooling system for the chamber walls and door.
    • A closed loop pyrometer cooling system, to maintain the pyrometer at a constant temperature.

    The chamber cooling system operates during any period when power is applied to the lamps and must remain operational for 5 minutes after lamp power has been removed. The air system provides a continual flow through the system cabinet, around the lamps and the quartz isolation tube. This eliminates residual heat from the chamber. The pyrometer cooling system operates continuously, whenever power is applied to the pyrometer chiller, to stabilize and maintain the temperature of the pyrometer.

    Quartz Isolation Tube and Pneumatic 

    Cooling Air typeNitrogen (N2) or Clean-Dry-Air (CDA) oil‑and-water-free, filtered to 3 micronsflow rate10-15 scfm (283-425 slpm)minimum inlet pressure40 psig (300 kPa)typical fitting3/8″ Parker Push-Lok tubing3/8″ OD nylon tubing

    Oven

    Cooling Watertype100% distilled water

    ISO 3696 Grade 1 (resistivity at < 10 MOhm-cm corrected to 25°C)

    pre-filtered with conventional particulate filter to 100 microns (No DI Water)flow rate2 gpm (7.5 lpm)minimum pressure differential30 – 50 psi (2.1 – 3.5 kg/cm2)  inlet pressure30 psig (2.11 kg/cm2)minimum  40 psig (2.81 kg/cm2)typical  60 psig (4.22 kg/cm2)maximum inlet temperature59°F (15°C) (3 °C above dew point)minimum  68°F (20°C)typical  95°F (35°C)maximum oven fitting,

    inlet and outlet1/2” tube x 3/8” male pipe Swagelok atmospheric humiditynon‑condensing

    5. Process Gases

    Process Gases type Any inert and/or non-corrosive gas.

     

    Typically, Nitrogen (N2), oxygen (O2), argon (Ar), and/or helium (He) are used.pressure15 psig (1.1 kg/cm2)minimum  20 psig (1.4 kg/cm2)typical  30 psig (2.1 kg/cm2)maximum flow rate0-10 SLPM  filteringpre-filtered to 1 micron fitting1/4″ female VCR fitting or 1/4” tube Swagelok

    6. Exhaust

    Oven Cabinet

    Exhaust

     flow rate100 scfm (3000slpm)fitting4″ exhaust vent connected to house exhaust system

    Gas Box

    Exhaust

    (optional)flow rate100 scfm (3000slpm)fitting4″ exhaust vent connected to house exhaust system

    FAQ on Rapid Thermal Processing Systems:

    1. Q: Which model should I purchase?
    A: Normally your biggest substrate size determines the model. AW 410 is up to 4 inch;AW 610,AW 610V are up to 6 inch; AW 810,AW 820, AW 820V are up to 8 inch.

    2. Q: Can I use AW 610,AW 810 for 2 inch substrate?
    A: Yes. You can run 4 pieces of 2 inch on AW 610 and 16 pieces of 2 inch on AW 810 in one batch.

    3. Q: Which type of RTP should I purchase, Atmospheric or Vacuum?
    A: You can run most processes by Atmospheric RTP. Atmospheric RTP has much better performance ( repeatability, stability, uniformity) than vacuum RTP because of atmospheric RTP’s compact chamber design, isolated quartz tube, top&bottom lamp heat, pure gas purge, 30 years approval. The ownership cost and usage cost of Atmospheric RTP are lower. If you are not sure that you have to use vacuum RTP because of O2, you can buy atmospheric RTP with forming gas to get 2 to 12 PPM O2 environment instead of vacuum RTP.

    4. Q: What are the differences in Allwin21 vacuum RTPs?
    A: AW 610V is up to 6 inch wafer. It comes with only cross top lamp heat. The maximum temperature is 1000C @ 2 minutes. AW 820V is up to 8 inch wafer. It comes with top and bottom lamp heat.The maximum temperature is 1250C @ 10 minutes. AW 860V is automatic system with reliable robotic wafer transfer. AW610V & AW820V are manual loading.

    5. Q: Should I have to use susceptor for transparent substrate?
    A: Normally transparent substrate can not absorb lamp heat since it is transparent. You have to use carrier which can absorb lamp heat and transfer the heat to transparent substrate. Susceptors can be made of SiC, Silica,Graphite,or Si. They can be costly. You can use a Si wafer as carrier if your process is applicable. You can us a Si wafer with pocket, instead of susceptor, if your budget is tight. A susceptor will lower the ramp rate and cooling rate significantly because of its size and thickness.

    6. Q: Which material of susceptor should I purchase?
    A: Traditionally people use graphite with SiC coating for susceptor. Graphite susceptor is for up to 900C with lower ramp rate. Silica susceptor is for up to 1100C with higher ramp rate. Sintered SiC susceptor is for up to 1100C with lower ramp rate. Si susceptor is less expensive and up to 750C with lower ramp rate. The bigger the size of susceptor, the lower the ramp&cooling rate.

    7. Q: Should I purchase an ERP Pyrometer as high temperature sensor?
    A: Thermocouples (TC’s) are the traditional temperature sensor for lower than 1050C. But TC will react with Si wafer at 750C. Our patented ERP Pyrometer can work at 450~1250C with precise measurement after calibration by AW technology. TC has to contact the substrate for temperature measurement while ERP Pyrometer is non-contact. TC cost is lower while ERP Pyrometer’s is higher (more than $15K with calibration tools (TC wafer and omega meter). TC will evaporate at high temperature causing contamination.

    8. Q: Can I measure the temperature uniformity by multiple points TC wafer?
    A: If the temperature is lower than 500C, you can measure the temperature uniformity by TC wafer directly. If the temperature is higher than 500C, you have to measure other parameters’s uniformity to reflect the process uniformity. The influence of lamp, chamber, the structure of TC wafer etc is significant at higher than 500C. Semiconductor industry measures sheet resistance. LED industry measures voltage.

    9. Q: Can I have a demo before purchase?
    A: We have demo systems in our facility in USA. We can do demo one time for you if you can send your wafer to us and our facilities are applicable. But be aware that you cannot evaluate the performance by one demo result because of the following. (1) The demo condition might not be good enough; (2) Your recipe parameters might not be applicable because RTP temperature number in recipe is relative, not real.

    10. Q: What is the most important feature for RTP system?
    A: Repeatability. If the RTP system performance is not repeatable, the RTP will be “Rapid Trash Process”.

    11. Q: How many gas lines can Allwin21 RTP come with?
    A: AW 410, AW 610 come with 1, or 2 to 4, or 5 to 6. AW 810, AW 820 come with 2 to 4 lines. AW 610V,AW 820V comes with 2 to 3 lines. Customizing is optional. The popular MFCs are 10 SLM N2, Ar, O2 and 5 SLM NH3, N2O2.

    12. Q: Can customer install the RTP by themselves?
    A: Yes. Our RTP systems are customer-install design. We sold our RTP systems to more than 40 countries. Most customers installed our RTP systems by themselves according to our professional manuals. We provide free technical supports by email, phone, skype etc. We have local reps who can provide 24/7 service in some countries.

    13. Q: Why should we purchase an RTP from Allwin21?
    A: (1) Best repeatability
    (2) Our system hardware and software technology have been approved based on 30 years of semiconductor industry development.
    (3) It can cost a lot money and time to test an unpopular or new RTP systems .
    (4) Allwin21 focuses on RTP as our main business. We professionally provide high quality RTP system and technical support.
    (5) Reasonable price accepted by 40 countries’ clients.
    (6) Industry-leading lead time (2 to 4 weeks).

    Contact Us for More Information

    RFQ-RTP

      Please help fill in the following Customer Survey Form for suitable Rapid Thermal Processing System model and configuration for your applications. Appreciate your time. Thank you very much.

      1. Your Name(Required):

      2. Your Email(Required):

      3. Your Company Name(Required):

      4. Company Address:

      5. Substrate Maximum Size(Required):

      6. Substrate Material(Required):
      SiSiCGaAsGaNGaInPInPThin Metal FilmOthersNot sure
      7. Amount of Gas lines and Gas Types(Required):

      8. Highest Temperature Range (Required,°C):

      9. Do you need susceptor? If yes, pls specify the size and quantity.

      10. Did you use any RTP which met your requirements? If yes, pls specify brand and model(Required).

      11. Do you know AG Associates Heatpulse RTP?If yes, pls tell us which model you know(Required).

      12. How do you evaluate the RTP performance? Pls specify the methods and specifications if possible.

      13. Special Requirements:

      Enter the characters shown in the image. captcha

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